SCHEMBL16675100

SCHEMBL16675100

C=C(C)C(=O)OC1(CC)CCCC1C1CCCC1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29117753 0.94 ALDH1A1 (0.30) ALDH1A1
SCHEMBL10005765 0.84 CYP3A4 (0.31) ALDH1A1
SCHEMBL14136148 0.82 ALDH1A1 (0.37) ALDH1A1
SCHEMBL13713864 0.81 ALDH1A1 (0.33) ALDH1A1
SCHEMBL14519278 0.79 ALDH1A1 (0.32) ALDH1A1
SCHEMBL21026955 0.79 ALDH1A1 (0.32) ALDH1A1
SCHEMBL14519293 0.79 ALDH1A1 (0.32) ALDH1A1
SCHEMBL6064776 0.79 ALDH1A1 (0.31) ALDH1A1
SCHEMBL825586 0.79 ALDH1A1 (0.31) ALDH1A1
SCHEMBL955117 0.77 ALDH1A1 (0.32) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9639002-B2 Method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2017-05-02 US disclosed
US-9639002-B2 Method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2017-05-02 US disclosed
US-9405190-B2 Method for forming resist pattern and resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 2016-08-02 US disclosed
US-9405190-B2 Method for forming resist pattern and resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 2016-08-02 US disclosed
US-20160116843-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2016-04-28 US disclosed
US-20160116843-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2016-04-28 US disclosed
US-20150118616-A1 METHOD FOR FORMING RESIST PATTERN AND RESIST COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2015-04-30 US disclosed
US-20150118616-A1 METHOD FOR FORMING RESIST PATTERN AND RESIST COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2015-04-30 US disclosed