⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9880660 | 0.94 | — | — | |
| SCHEMBL16142329 | 0.90 | — | — | |
| SCHEMBL9880662 | 0.80 | — | — | |
| SCHEMBL9883122 | 0.75 | — | — | |
| SCHEMBL9880665 | 0.74 | — | — | |
| SCHEMBL24116218 | 0.73 | — | — | |
| SCHEMBL17166503 | 0.71 | — | — | |
| SCHEMBL25129405 | 0.67 | — | — | |
| SCHEMBL16905092 | 0.66 | — | — | |
| SCHEMBL24380158 | 0.65 | CHRM2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9046767-B2 | Photoacid generator, photoresist, coated substrate, and method of forming an electronic device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-06-02 | — | — | US | disclosed |
| US-20150118618-A1 | PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2015-04-30 | — | — | US | disclosed |