⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20860455 | 0.79 | — | — | |
| SCHEMBL21249332 | 0.77 | TDP1 (0.30) | — | |
| SCHEMBL19491878 | 0.72 | — | — | |
| SCHEMBL16140247 | 0.70 | ALDH1A1 (0.40) | — | |
| SCHEMBL25113152 | 0.70 | CYP1A2 (0.34) | — | |
| SCHEMBL23641340 | 0.70 | CYP1A2 (0.31) | — | |
| SCHEMBL24244857 | 0.70 | MEN1 (0.36) | — | |
| SCHEMBL25069152 | 0.67 | — | — | |
| SCHEMBL18785293 | 0.67 | CYP1A2 (0.35) | — | |
| SCHEMBL12039740 | 0.67 | POLB (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-20230099348-A1 | PHOTORESIST COMPOSITION COMPRISING AMIDE COMPOUND AND PATTERN FORMATION METHODS USING THE SAME | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2023-03-30 | — | — | US | disclosed |