⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17175347 | 0.76 | HPGD (0.35) | — | |
| SCHEMBL17175322 | 0.73 | ALDH1A1 (0.35) | — | |
| SCHEMBL17147967 | 0.73 | PPARA (0.36) | — | |
| SCHEMBL14028976 | 0.72 | ALDH1A1 (0.38) | — | |
| SCHEMBL18473446 | 0.72 | SLC7A5 (0.36) | — | |
| SCHEMBL16081313 | 0.72 | ALDH1A1 (0.34) | — | |
| SCHEMBL17175381 | 0.71 | PDE4B (0.35) | — | |
| SCHEMBL17402202 | 0.70 | ALDH1A1 (0.36) | — | |
| SCHEMBL15279319 | 0.69 | ALDH1A1 (0.39) | — | |
| SCHEMBL16247798 | 0.69 | ALDH1A1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150293446-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| US-20150118628-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |