SCHEMBL16683075

SCHEMBL16683075

CCC(C)c1ccc(OC(CC(C)(C)CC)OC2C3CC4CC(C3)CC2C4)cc1

nearest known ligand 0.33

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.33
SLC7A5 Q01650 1/20 0.33
TSHR P16473 1/20 0.33
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
TDP1 Q9NUW8 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31
GAA P10253 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17175301 0.91 ALDH1A1 (0.34) ALDH1A1SLC7A5TSHRMEN1KMT2A
SCHEMBL16081317 0.84 ALDH1A1 (0.32) ALDH1A1SLC7A5TSHRKMT2A
SCHEMBL18474085 0.81 SLC7A5 (0.39) ALDH1A1SLC7A5TSHRMEN1KMT2A
SCHEMBL16247796 0.81 ALDH1A1 (0.35) ALDH1A1SLC7A5TSHRMEN1KMT2A
SCHEMBL14667707 0.81 SLC7A5 (0.40) ALDH1A1SLC7A5TSHRMEN1KMT2A
SCHEMBL14177779 0.80 ALDH1A1 (0.38) ALDH1A1SLC7A5TSHRMEN1KMT2A
SCHEMBL17424296 0.80 ALDH1A1 (0.35) ALDH1A1SLC7A5TSHRMEN1KMT2A
SCHEMBL17175392 0.78 ALDH1A1 (0.37) ALDH1A1SLC7A5TSHRMEN1KMT2A
SCHEMBL14461832 0.78 ALDH1A1 (0.32) ALDH1A1SLC7A5TSHRMEN1KMT2A
SCHEMBL14461913 0.76 SLC7A5 (0.31) ALDH1A1SLC7A5TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150293446-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-15 US disclosed
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed