SCHEMBL16683081

SCHEMBL16683081

CCC(C)c1ccc(OC(Oc2ccccc2)C(C)C)cc1

nearest known ligand 0.54

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
SLC7A5 Q01650 1/20 0.54
ALDH1A1 P00352 3/20 0.49
TSHR P16473 1/20 0.49
LTB4R Q15722 1/20 0.43
LTB4R2 Q9NPC1 1/20 0.43
MAPT P10636 2/20 0.41
GAA P10253 1/20 0.41
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
CASP1 P29466 1/20 0.38
ABCB1 P08183 2/20 0.38
TRPA1 O75762 1/20 0.38
TAAR1 Q96RJ0 2/20 0.37
AOC3 Q16853 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13918196 0.86 SLC7A5 (0.56) SLC7A5ALDH1A1TSHRLTB4RLTB4R2
SCHEMBL12040224 0.85 ALDH1A1 (0.47) SLC7A5ALDH1A1TSHRNPC1RAB9A
SCHEMBL11999039 0.85 SLC7A5 (0.44) SLC7A5ALDH1A1TSHRLTB4RLTB4R2
SCHEMBL18470647 0.85 SLC7A5 (0.47) SLC7A5ALDH1A1TSHRLTB4RLTB4R2
SCHEMBL4545201 0.84 ALDH1A1 (0.46) SLC7A5ALDH1A1TSHRMAPTGAA
SCHEMBL11999040 0.83 SLC7A5 (0.51) SLC7A5ALDH1A1TSHRLTB4RLTB4R2
SCHEMBL2607792 0.83 ALDH1A1 (0.45) SLC7A5ALDH1A1TSHRLTB4RLTB4R2
SCHEMBL11999035 0.83 SLC7A5 (0.57) SLC7A5ALDH1A1TSHRLTB4RLTB4R2
SCHEMBL17070151 0.83 ALDH1A1 (0.45) SLC7A5ALDH1A1TSHRLTB4RLTB4R2
SCHEMBL11922914 0.82 SLC7A5 (0.45) SLC7A5ALDH1A1TSHRLTB4RLTB4R2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160291461-A1 PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, BLOCK COPOLYMER AND BLOCK COPOLYMER PRODUCTION METHOD FUJIFILM CORPORATION (JP) 2016-10-06 US disclosed
US-9448477-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-09-20 US disclosed
US-20150185612-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-07-02 US disclosed
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed