SCHEMBL16683142

SCHEMBL16683142

CCC(C)c1ccc(Oc2ccc(S(=O)(=O)O)cc2)c(OC)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.44
ALDH1A1 P00352 3/20 0.44
MAPT P10636 2/20 0.44
TP53 P04637 1/20 0.44
ALOX12 P18054 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.42
NFKB1 P19838 1/20 0.42
HIF1A Q16665 1/20 0.42
CASP1 P29466 1/20 0.42
KMT2A Q03164 1/20 0.41
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
ACHE P22303 1/20 0.41
CA12 O43570 1/20 0.41
CA9 Q16790 1/20 0.41
TSHR P16473 3/20 0.40
HTT P42858 2/20 0.40
MAPK1 P28482 2/20 0.40
POLB P06746 1/20 0.40
GAA P10253 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16591098 0.84 ALDH1A1 (0.50) LMNAALDH1A1MAPTSMN1; SMN2CASP1
SCHEMBL16081290 0.84 ALDH1A1 (0.50) LMNAALDH1A1MAPTSMN1; SMN2CASP1
SCHEMBL11922894 0.79 ALDH1A1 (0.50) LMNAALDH1A1MAPTTP53ALOX12
SCHEMBL12086454 0.78 MEN1 (0.51) LMNAALDH1A1SMN1; SMN2KMT2ATSHR
SCHEMBL116856 0.78 MEN1 (0.51) LMNAALDH1A1SMN1; SMN2KMT2ATSHR
SCHEMBL10031603 0.78 MEN1 (0.51) LMNAALDH1A1SMN1; SMN2KMT2ATSHR
SCHEMBL14119479 0.78 MAPT (0.44) LMNAALDH1A1MAPTTP53ALOX12
SCHEMBL11151390 0.77 ALDH1A1 (0.47) LMNAALDH1A1MAPTTP53ALOX12
Hydrochloric Acid SCHEMBL27560309 0.76 MEN1 (0.50) LMNAALDH1A1KMT2ATSHRGAA
SCHEMBL14464083 0.76 ALDH1A1 (0.55) LMNAALDH1A1SMN1; SMN2KMT2ACA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed