SCHEMBL16684183

SCHEMBL16684183

C=Cc1ccc(Oc2c(F)c(F)c([SH](=O)=O)c(F)c2F)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.36
ALDH1A1 P00352 1/20 0.35
HPGD P15428 1/20 0.35
HTT P42858 1/20 0.35
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA7 P43166 1/20 0.34
CA13 Q8N1Q1 1/20 0.34
CHRNB2 P17787 1/20 0.30
CHRNB4 P30926 1/20 0.30
CHRNA3 P32297 1/20 0.30
CHRNA7 P36544 1/20 0.30
CHRNA4 P43681 1/20 0.30
MAPT P10636 2/20 0.30
POLB P06746 1/20 0.30
HSP90AA1 P07900 1/20 0.30
MEN1 O00255 1/20 0.30
LMNA P02545 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16684188 0.87 POLB (0.33) HSD17B10HPGDHTTMAPTPOLB
SCHEMBL940862 0.84 ALDH1A1 (0.46) HSD17B10ALDH1A1HPGDHTTCA12
SCHEMBL17752220 0.81 ALDH1A1 (0.42) HSD17B10ALDH1A1HPGDHTTCA12
SCHEMBL24811311 0.78 ALDH1A1 (0.39) HSD17B10ALDH1A1HPGDHTTCA12
SCHEMBL16596689 0.76 USP2 (0.32) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL15189382 0.75 TDP1 (0.46) HSD17B10ALDH1A1HPGDHTTCA12
SCHEMBL21153835 0.74 SMN1; SMN2 (0.38) HSD17B10ALDH1A1HPGDHTTCHRNB2
SCHEMBL19981188 0.73 HPGD (0.35) HSD17B10ALDH1A1HPGDHTTCA12
SCHEMBL16683010 0.73 TDP1 (0.44) HSD17B10ALDH1A1HPGDHTTCA12
SCHEMBL17752221 0.72 ALDH1A1 (0.37) HSD17B10ALDH1A1HPGDHTTCHRNB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed