SCHEMBL1668699

SCHEMBL1668699

C=CCOC(CC)S(=O)(=O)O

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4532066 0.85 TSHR (0.33) TSHR
SCHEMBL17629263 0.80 SLC22A6 (0.32)
SCHEMBL5064920 0.80
SCHEMBL27943659 0.78 CA1 (0.41)
SCHEMBL600804 0.78
SCHEMBL28375975 0.78 MEN1 (0.33) MEN1KMT2A
SCHEMBL7057260 0.77
SCHEMBL11033174 0.76 THRB (0.35)
SCHEMBL27458885 0.76 MEN1 (0.31) MEN1KMT2A
SCHEMBL27640097 0.76 MEN1 (0.31) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119662134-A Silicon wafer polishing composition and preparation process thereof 万华化学集团电子材料有限公司 2025-03-21 CN claimed
CN-114614017-A Binder, negative pole piece and lithium ion battery 深圳市皓飞实业有限公司 2022-06-10 CN claimed
CN-122011278-A Quaternary copolymer-based hard water-resistant agricultural dispersing agent, and preparation method and application thereof 山东德胜精细化工研究院有限公司 2026-05-12 CN disclosed
EP-3845606-B1 HYDROGEL AND USES THEREFOR SEKISUI KASEI CO LTD (JP) 2026-02-18 EP disclosed
US-12415895-B2 Hydrogel and uses therefor SEKISUI KASEI CO., LTD. (JP) 2025-09-16 US disclosed
CN-119662134-A Silicon wafer polishing composition and preparation process thereof 万华化学集团电子材料有限公司 2025-03-21 CN disclosed
WO-2024262451-A1 PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, AND OPTICAL ELEMENT AGC株式会社 2024-12-26 WO disclosed
WO-2024135575-A1 PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, AND OPTICAL ELEMENT AGC株式会社 2024-06-27 WO disclosed
WO-2024038814-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, AND OPTICAL ELEMENT AGC株式会社 2024-02-22 WO disclosed
CN-111417669-B Fluorine-containing active energy ray-curable resin, liquid repellent, resin composition containing same, and cured film DIC株式会社 2023-11-10 CN disclosed
CN-112533997-B Hydrogels and uses thereof 积水化成品工业株式会社 2023-09-26 CN disclosed
EP-2148918-A1 PHOSPHATE-FREE DISHWASHER DETERGENT WITH EXCELLENT RINSING POWER BASF SE (DE) 2010-02-03 EP disclosed
US-7566751-B2 Sulfonate functional polyvinyl acetals KURARAY EUROPE GMBH (DE) 2009-07-28 US disclosed
WO-2008132133-A1 PHOSPHATE-FREE DISHWASHER DETERGENT WITH EXCELLENT RINSING POWER BASF SE (DE) 2008-11-06 WO disclosed
EP-1948770-A1 COMPOSITION Reckitt Benckiser N.V. (NL) 2008-07-30 EP disclosed
US-20080076871-A1 Sulfonate Functional Polyvinyl Acetals WACKER POLYMER SYSTEMS GMBH & CO. KG (DE) 2008-03-27 US disclosed
EP-1763543-B1 SULFONATE FUNCTIONAL POLYVINYL ACETALS WACKER POLYMER SYSTEMS GMBH (DE) 2007-10-31 EP disclosed
WO-2007052064-A1 COMPOSITION RECKITT BENCKISER N.V. (NL) 2007-05-10 WO disclosed
EP-1763543-A1 SULFONATE FUNCTIONAL POLYVINYL ACETALS Wacker Polymer Systems GmbH & Co. KG (DE) 2007-03-21 EP disclosed
WO-2006002832-A1 SULFONATE FUNCTIONAL POLYVINYL ACETALS WACKER POLYMER SYSTEMS GMBH & CO. KG (DE) 2006-01-12 WO disclosed