⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL108134 | 1.00 | — | — | |
| SCHEMBL12892110 | 0.86 | — | — | |
| SCHEMBL10183584 | 0.86 | — | — | |
| SCHEMBL23383199 | 0.85 | — | — | |
| SCHEMBL13239976 | 0.84 | — | — | |
| SCHEMBL2618644 | 0.83 | — | — | |
| SCHEMBL15219416 | 0.83 | — | — | |
| SCHEMBL13019214 | 0.83 | — | — | |
| SCHEMBL18177009 | 0.82 | — | — | |
| SCHEMBL14532282 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9023576-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |