SCHEMBL14532282

SCHEMBL14532282

CC(C)C1C2CC(CC(O)(C(F)(F)F)C(F)(F)F)C(C2)C1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14315719 0.88 — —
SCHEMBL14460005 0.82 — —
SCHEMBL16687971 0.82 — —
SCHEMBL108134 0.82 — —
SCHEMBL15219416 0.77 — —
SCHEMBL19497258 0.77 — —
SCHEMBL15866050 0.76 — —
SCHEMBL23383199 0.75 — —
SCHEMBL21325607 0.74 — —
SCHEMBL15243255 0.74 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7211366-B2 Photoresist composition for deep ultraviolet lithography AZ ELECTRONIC MATERIALS USA CORP. (US) 2007-05-01 — — US disclosed
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