SCHEMBL16690163

SCHEMBL16690163

CCCC(=O)O/N=C(/C)C(=O)c1ccc(-c2ccccc2[N+](=O)[O-])cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
TDP1 Q9NUW8 1/20 0.42
MAPT P10636 5/20 0.40
KMT2A Q03164 4/20 0.40
MEN1 O00255 3/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
HRH2 P25021 1/20 0.39
HRH1 P35367 1/20 0.39
GLA P06280 2/20 0.38
ADAMTS4 O75173 1/20 0.38
MAOB P27338 1/20 0.37
LMNA P02545 3/20 0.36
BCL9 O00512 1/20 0.36
CTNNB1 P35222 1/20 0.36
AVPR2 P30518 1/20 0.36
AVPR1A P37288 1/20 0.36
HTT P42858 1/20 0.35
RAB9A P51151 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
CES2 O00748 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16690269 0.94 KMT2A (0.41) ALDH1A1TDP1MAPTKMT2AMEN1
SCHEMBL16690174 0.89 ALDH1A1 (0.43) ALDH1A1TDP1MAPTKMT2AMEN1
SCHEMBL16690185 0.88 ALDH1A1 (0.41) ALDH1A1TDP1MAPTKMT2AMEN1
SCHEMBL16690178 0.87 ALDH1A1 (0.42) ALDH1A1TDP1MAPTKMT2AMEN1
SCHEMBL16690181 0.87 ALDH1A1 (0.43) ALDH1A1TDP1MAPTKMT2AMEN1
SCHEMBL16690226 0.86 ALDH1A1 (0.48) ALDH1A1TDP1MAPTKMT2AMEN1
SCHEMBL16690271 0.83 SMN1; SMN2 (0.48) ALDH1A1TDP1MAPTKMT2AMEN1
SCHEMBL16690167 0.83 ALDH1A1 (0.40) ALDH1A1TDP1MAPTKMT2AMEN1
SCHEMBL16690195 0.83 BCL9 (0.51) ALDH1A1MAPTKMT2AMEN1LMNA
SCHEMBL16690158 0.83 KMT2A (0.43) ALDH1A1TDP1MAPTKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2015064958-A1 NOVEL OXIME ESTER BIPHENYL COMPOUND, PHOTO INITIATOR AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME 한국화학연구원 2015-05-07 WO disclosed