SCHEMBL16690261

SCHEMBL16690261

C/C(=N/OC(=O)c1ccccc1)C(=O)c1ccc(-c2ccc([N+](=O)[O-])cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CES1 P23141 2/20 0.56
CES2 O00748 1/20 0.56
SMN1; SMN2 Q16637 2/20 0.55
POLB P06746 3/20 0.52
MAPK1 P28482 1/20 0.52
NPC1 O15118 7/20 0.51
MAPT P10636 6/20 0.51
RAB9A P51151 6/20 0.51
L3MBTL1 Q9Y468 2/20 0.51
PKM P14618 1/20 0.51
XDH P47989 1/20 0.51
KMT2A Q03164 7/20 0.50
MEN1 O00255 6/20 0.50
ALDH1A1 P00352 3/20 0.50
AHR P35869 1/20 0.49
HTT P42858 1/20 0.48
CRHBP P24387 1/20 0.46
CRHR2 Q13324 1/20 0.46
ALOX5 P09917 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17973432 0.89 SMN1; SMN2 (0.53) CES1CES2SMN1; SMN2POLBMAPK1
SCHEMBL16690265 0.88 CES2 (0.49) CES1CES2SMN1; SMN2POLBNPC1
SCHEMBL16690217 0.86 CES1 (0.57) CES1CES2SMN1; SMN2POLBMAPK1
SCHEMBL16690221 0.85 CES1 (0.53) CES1CES2POLBMAPK1NPC1
SCHEMBL16690266 0.84 CES2 (0.52) CES1CES2SMN1; SMN2POLBMAPK1
SCHEMBL16690271 0.84 SMN1; SMN2 (0.48) CES1CES2SMN1; SMN2POLBNPC1
SCHEMBL195166 0.82 KMT2A (0.62) CES1CES2SMN1; SMN2NPC1MAPT
SCHEMBL20278523 0.82 KMT2A (0.62) CES1CES2SMN1; SMN2NPC1MAPT
SCHEMBL195165 0.82 KMT2A (0.62) CES1CES2SMN1; SMN2NPC1MAPT
SCHEMBL17973392 0.81 SMN1; SMN2 (0.50) CES1CES2SMN1; SMN2POLBMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2015064958-A1 NOVEL OXIME ESTER BIPHENYL COMPOUND, PHOTO INITIATOR AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME 한국화학연구원 2015-05-07 WO disclosed