⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7990371 | 0.67 | — | — | |
| SCHEMBL20049585 | 0.65 | — | — | |
| SCHEMBL18922082 | 0.65 | — | — | |
| SCHEMBL7980897 | 0.65 | ALDH1A1 (0.31) | — | |
| SCHEMBL2068452 | 0.65 | — | — | |
| SCHEMBL9732414 | 0.64 | — | — | |
| SCHEMBL2689747 | 0.63 | ALDH1A1 (0.30) | — | |
| SCHEMBL3468436 | 0.63 | MAPT (0.32) | — | |
| SCHEMBL6364955 | 0.63 | ALDH1A1 (0.30) | — | |
| SCHEMBL1045178 | 0.63 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12619144-B2 | Positive photosensitive resin composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2026-05-05 | — | — | US | claimed |
| CN-116640492-A | High-pressure solvent-free impregnating varnish with high storage stability and preparation method and application thereof | 上海电气集团上海电机厂有限公司 | 2023-08-25 | — | — | CN | claimed |
| US-20220334478-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2022-10-20 | — | — | US | claimed |
| CN-111253425-B | Synthesis method of 1, 3-bis [2- (3, 4-epoxycyclohexyl) ethyl ] tetramethyldisiloxane | 常州南京大学高新技术研究院 | 2022-04-29 | — | — | CN | claimed |
| CN-111269254-B | Microwave synthesis method of 1, 3-bis [2- (3, 4-epoxycyclohexyl) ethyl ] tetramethyldisiloxane | 常州南京大学高新技术研究院 | 2022-04-08 | — | — | CN | claimed |
| WO-2021137599-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | 주식회사 동진쎄미켐 | 2021-07-08 | — | — | WO | claimed |
| CN-111269254-A | Microwave synthesis method of 1, 3-bis [2- (3, 4-epoxycyclohexyl) ethyl ] tetramethyldisiloxane | 常州南京大学高新技术研究院 | 2020-06-12 | — | — | CN | claimed |
| CN-111253425-A | Synthesis method of 1, 3-bis [2- (3, 4-epoxycyclohexyl) ethyl ] tetramethyldisiloxane | 常州南京大学高新技术研究院 | 2020-06-09 | — | — | CN | claimed |
| EP-1358193-B1 | PROCESS FOR PURIFICATION OF PHOSPHATE ESTERS | AKZO NOBEL NV (NL) | 2009-12-09 | — | — | EP | claimed |
| EP-0571114-A1 | Polish containing silylated derivatives of organic amines and epoxides | DOW CORNING CORPORATION (US) | 1993-11-24 | — | — | EP | claimed |
| EP-0570173-A2 | Coating composition containing silylated derivatives of organic amines and epoxides | DOW CORNING CORPORATION (US) | 1993-11-18 | — | — | EP | claimed |
| US-5258063-A | Polish containing silylated derivatives of organic amines and epoxides | DOW CORNING CORPORATION (US) | 1993-11-02 | — | — | US | claimed |
| EP-4743505-A2 | NOVEL PHOTOSENSITIVE CARBON DIOXIDE BASED POLYCARBONATE DERIVATIVES AND METHOD FOR PREPARATION OF PHOTO-ANTIMICROBIAL POLYCARBONATE-BIOPLASTICIZER COMPOSITES AND THEIR USE | Universidade de Coimbra (PT) | 2026-05-20 | — | — | EP | disclosed |
| US-12619144-B2 | Positive photosensitive resin composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2026-05-05 | — | — | US | disclosed |
| US-20260005023-A1 | METHODS FOR FABRICATING SEMICONDUCTOR DEVICES AND RESIST COMPOSITIONS FOR UNDERLAYERS USED THEREFOR | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-01-01 | — | — | US | disclosed |
| US-20250110407-A1 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM FORMING COMPOSITION | JSR CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| EP-0571114-A1 | Polish containing silylated derivatives of organic amines and epoxides | DOW CORNING CORPORATION (US) | 1993-11-24 | — | — | EP | disclosed |
| EP-0570173-A2 | Coating composition containing silylated derivatives of organic amines and epoxides | DOW CORNING CORPORATION (US) | 1993-11-18 | — | — | EP | disclosed |
| US-5258063-A | Polish containing silylated derivatives of organic amines and epoxides | DOW CORNING CORPORATION (US) | 1993-11-02 | — | — | US | disclosed |
| EP-0432093-A1 | Highly reactive printing inks | SICPA HOLDING S.A. (CH) | 1991-06-12 | — | — | EP | disclosed |