Formaldehyde

Formaldehyde

SCHEMBL16715319

C=O.C=O.C=O.CCC1=C([W])CC=C1

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27776630 0.93
Carbon Monoxide SCHEMBL1349899 0.91
SCHEMBL27776632 0.91
Acetonitrile SCHEMBL1097408 0.83
Formaldehyde SCHEMBL15662280 0.74
SCHEMBL27765261 0.70
SCHEMBL21120387 0.68
SCHEMBL2591738 0.67
SCHEMBL4477480 0.67
SCHEMBL1485897 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9034760-B2 Methods of forming tensile tungsten films and compressive tungsten films NOVELLUS SYSTEMS, INC. (US) 2015-05-19 US disclosed