Styrene

Styrene

SCHEMBL1672302

C=Cc1ccccc1.NS(=O)(=O)O

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.64
TSHR P16473 2/20 0.64
TDP1 Q9NUW8 1/20 0.54
CA2 P00918 6/20 0.41
CA1 P00915 5/20 0.41
CA9 Q16790 4/20 0.41
CA12 O43570 2/20 0.41
CA5A P35218 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
CA3 P07451 1/20 0.41
CA4 P22748 1/20 0.41
CA6 P23280 1/20 0.41
CA7 P43166 1/20 0.41
PLA2G7 Q13093 1/20 0.41
CA13 Q8N1Q1 1/20 0.41
CA14 Q9ULX7 1/20 0.41
CA5B Q9Y2D0 1/20 0.41
PTGS2 P35354 1/20 0.39
CYP2A6 P11509 1/20 0.39
MCL1 Q07820 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL28200088 0.91 ALDH1A1 (0.64) ALDH1A1TSHRTDP1CA2SMN1; SMN2
Styrene SCHEMBL4818039 0.91 ALDH1A1 (0.70) ALDH1A1TSHRTDP1CA2CA1
Styrene SCHEMBL1261405 0.91 ALDH1A1 (0.70) ALDH1A1TSHRTDP1SMN1; SMN2CYP2A6
Styrene SCHEMBL5604788 0.88 ALDH1A1 (0.67) ALDH1A1TSHRTDP1SMN1; SMN2CYP2A6
Styrene SCHEMBL9625915 0.88 ALDH1A1 (0.67) ALDH1A1TSHRTDP1SMN1; SMN2CYP2A6
Styrene SCHEMBL4274360 0.88 ALDH1A1 (0.67) ALDH1A1TSHRTDP1SMN1; SMN2CYP2A6
Styrene SCHEMBL15313173 0.88 ALDH1A1 (0.67) ALDH1A1TSHRTDP1SMN1; SMN2CYP2A6
Styrene SCHEMBL8526059 0.86 ALDH1A1 (0.64) ALDH1A1TSHRTDP1SMN1; SMN2CYP2A6
Styrene SCHEMBL9453760 0.86 ALDH1A1 (0.64) ALDH1A1TSHRTDP1CA2CA1
Styrene SCHEMBL29220702 0.86 ALDH1A1 (0.64) ALDH1A1TSHRTDP1CA2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116285497-A Washing-resistant ink for printing and dyeing and preparation method thereof 常熟市琴达针织印染有限公司 2023-06-23 CN claimed
CN-106731867-A The preparation method and preparation facilities of a kind of efficient anti-pollution reverse osmosis membrane 厦门建霖工业有限公司 2017-05-31 CN claimed
CN-116285497-A Washing-resistant ink for printing and dyeing and preparation method thereof 常熟市琴达针织印染有限公司 2023-06-23 CN disclosed
CN-106731867-A The preparation method and preparation facilities of a kind of efficient anti-pollution reverse osmosis membrane 厦门建霖工业有限公司 2017-05-31 CN disclosed
CN-106731867-A The preparation method and preparation facilities of a kind of efficient anti-pollution reverse osmosis membrane 厦门建霖工业有限公司 2017-05-31 CN disclosed
US-8932493-B2 Conductive polymer, conductive polymer composition, conductive polymer organic film, and organic photoelectric device including the same CHEIL INDUSTRIES, INC. (KR) 2015-01-13 US disclosed
US-20110253946-A1 CONDUCTIVE POLYMER, CONDUCTIVE POLYMER COMPOSITION, CONDUCTIVE POLYMER ORGANIC FILM, AND ORGANIC PHOTOELECTRIC DEVICE INCLUDING THE SAME CHEIL INDUSTRIES, INC. (KR) 2011-10-20 US disclosed
EP-2370543-A1 CONDUCTIVE POLYMER, POLYMER COMPOSITION, FILM AND ORGANIC PHOTOELECTRIC DEVICE INCLUDING SAME Cheil Industries Inc. (KR) 2011-10-05 EP disclosed
WO-2010074432-A9 CONDUCTIVE POLYMER, POLYMER COMPOSITION, FILM AND ORGANIC PHOTOELECTRIC DEVICE INCLUDING SAME CHEIL INDUSTRIES INC. (KR) 2011-04-28 WO disclosed
WO-2010074432-A1 CONDUCTIVE POLYMER, POLYMER COMPOSITION, FILM AND ORGANIC PHOTOELECTRIC DEVICE INCLUDING SAME CHEIL INDUSTRIES INC. (KR) 2010-07-01 WO disclosed
US-20060281027-A1 Aspherical-polymer fine particles and production method thereof, and method for producing lithographic printing plate, ink composition and electrophoretic particle composition FUJI PHOTO FILM CO., LTD. 2006-12-14 US disclosed
US-5049468-A Having excellent stability, fixing properties, high speed development; latex particles in dispersion stabilizer resin with acid bonding groups FUJI PHOTO FILM CO., LTD. (JP) 1991-09-17 US disclosed
US-5041352-A Dispersion stability, ink receptivity FUJI PHOTO FILM CO., LTD. (JP) 1991-08-20 US disclosed
EP-0440435-A2 Liquid developer for electrostatic photography FUJI PHOTO FILM CO., LTD. (JP) 1991-08-07 EP disclosed
US-5006441-A Redespersibility; storage stability; antisoilants; durability and fixability; image-reproduction FUJI PHOTO FILM CO., LTD. (JP) 1991-04-09 US disclosed
US-4983486-A Dispersed copolymer resin particles, dispersion stabilization resin, nonaqueous solvent FUJI PHOTO FILM CO., LTD. (JP) 1991-01-08 US disclosed
US-4977055-A RESIN DISPESEDIN NONAQUEOUS SOLVENT FUJI PHOTO FILM CO., LTD. (JP) 1990-12-11 US disclosed
EP-0392797-A2 Liquid developer for electrostatic photography FUJI PHOTO FILM CO., LTD. (JP) 1990-10-17 EP disclosed
EP-0376650-A2 Liquid developer for electrostatic photography FUJI PHOTO FILM CO., LTD. (JP) 1990-07-04 EP disclosed
EP-0366491-A2 Liquid developers for electrophotography FUJI PHOTO FILM CO., LTD. (JP) 1990-05-02 EP disclosed