SCHEMBL167367

SCHEMBL167367

CCCC(C)(N)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3421034 0.81
SCHEMBL1048011 0.79
Hydrochloric Acid SCHEMBL1914724 0.79 FDPS (0.37)
SCHEMBL9053793 0.79
Hydrochloric Acid SCHEMBL11320963 0.79
Hydrochloric Acid SCHEMBL9485806 0.77 FDPS (0.46)
SCHEMBL6938402 0.77 FDPS (0.50)
SCHEMBL9205361 0.77 FDPS (0.50)
SCHEMBL4286298 0.77 FDPS (0.50)
SCHEMBL9207157 0.77 FDPS (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 534 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12359125-B2 Silicon etchant composition, pattern formation method and manufacturing method of array substrate using the etchant composition, and array substrate manufactured therefrom DONGWOO FINE-CHEM CO., LTD. (KR) 2025-07-15 US claimed
CN-119432235-A Chemical mechanical polishing solution and preparation method and application thereof 芯越微电子材料(嘉兴)有限公司 2025-02-14 CN claimed
US-20250026960-A1 POLISHING SLURRY COMPOSITION KCTECH CO.,LTD. (KR) 2025-01-23 US claimed
CN-114231288-B Silicon etching liquid composition, pattern forming method, array substrate manufacturing method, and array substrate 东友精细化工有限公司 2023-12-26 CN claimed
WO-2023200905-A1 PROCESS FOR PRODUCTION OF HYDRAULIC-CARBONATING BINDER SYSTEMS THROUGH MECHANOCHEMICAL ACTIVATION OF MINERALS CARBONBUILT (US) 2023-10-19 WO claimed
WO-2023121037-A1 POLISHING SLURRY COMPOSITION 주식회사 케이씨텍 2023-06-29 WO claimed
CN-110291057-B Functionalized polyacrylic polymer compositions 亨茨曼国际有限公司 2022-08-26 CN claimed
US-11384255-B2 Polishing slurry composition for STI process KCTECH CO., LTD. (KR) 2022-07-12 US claimed
CN-114231288-A Silicon etching liquid composition, pattern forming method, array substrate manufacturing method, and array substrate 东友精细化工有限公司 2022-03-25 CN claimed
US-20220073819-A1 SILICON ETCHANT COMPOSITION, PATTERN FORMATION METHOD AND MANUFACTURING METHOD OF ARRAY SUBSTRATE USING THE ETCHANT COMPOSITION, AND ARRAY SUBSTRATE MANUFACTURED THEREFROM DONGWOO FINE-CHEM CO., LTD. (KR) 2022-03-10 US claimed
EP-1047645-A1 COMPOUND FOR USE AS A MINERAL FIBRE BINDER AND PROCESS FOR PROVIDING SUCH Rockwool International A/S (DK) 2000-11-02 EP claimed
EP-1036106-A1 CONDENSATION POLYMER CONTAINING HYDROXYALKYLAMIDE GROUPS DSM N.V. (NL) 2000-09-20 EP claimed
WO-1999036368-A1 COMPOUND FOR USE AS A MINERAL FIBRE BINDER AND PROCESS FOR PROVIDING SUCH ROCKWOOL INTERNATIONAL A/S (DK) 1999-07-22 WO claimed
WO-1999016810-A1 CONDENSATION POLYMER CONTAINING HYDROXYALKYLAMIDE GROUPS DSM N.V. (NL) 1999-04-08 WO claimed
EP-0670870-A4 POLYSILOXANE COATING. AMERON INC (US) 1995-12-06 EP claimed
EP-0670870-A1 POLYSILOXANE COATING AMERON INTERNATIONAL CORPORATION (US) 1995-09-13 EP claimed
EP-0380236-B1 Organopolysiloxane-polyurea block copolymer and method for its production MINNESOTA MINING & MFG (US) 1995-05-10 EP claimed
WO-1994012586-A1 POLYSILOXANE COATING AMERON, INC. (US) 1994-06-09 WO claimed
US-5275645-A Protective coatings of polysiloxanes from basic solutions with amines and organometallic catalysts AMERON, INC. (US) 1994-01-04 US claimed
EP-0380236-A2 Organopolysiloxane-polyurea block copolymer and method for its production MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-08-01 EP claimed