SCHEMBL1674657

SCHEMBL1674657

CC(O)N(C)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A2 P23975 6/20 0.48
SLC6A4 P31645 6/20 0.48
KDM4E B2RXH2 2/20 0.45
ALDH1A1 P00352 2/20 0.45
L3MBTL1 Q9Y468 2/20 0.43
AOC3 Q16853 1/20 0.42
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
HTT P42858 1/20 0.41
FAAH O00519 1/20 0.40
PHGDH O43175 1/20 0.40
MGLL Q99685 1/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA9 Q16790 1/20 0.40
POLB P06746 1/20 0.39
APOBEC3A P31941 1/20 0.39
APOBEC3G Q9HC16 1/20 0.39
LMNA P02545 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12157017 1.00 SLC6A2 (0.48) SLC6A2SLC6A4KDM4EALDH1A1L3MBTL1
SCHEMBL24340308 0.81 SLC6A2 (0.46) SLC6A2SLC6A4KDM4EALDH1A1L3MBTL1
SCHEMBL94821 0.79 MEN1 (0.44) SLC6A2SLC6A4KDM4EALDH1A1MEN1
SCHEMBL11160653 0.79 MEN1 (0.44) SLC6A2SLC6A4KDM4EALDH1A1L3MBTL1
SCHEMBL412645 0.78 ALDH1A1 (0.50) SLC6A2SLC6A4ALDH1A1MEN1KMT2A
SCHEMBL6395425 0.78 SLC6A2 (0.52) SLC6A2SLC6A4KDM4EALDH1A1AOC3
SCHEMBL5076555 0.77 ALDH1A1 (0.46) SLC6A2SLC6A4KDM4EALDH1A1AOC3
SCHEMBL104211 0.77 POLB (0.44) SLC6A2SLC6A4KDM4EALDH1A1AOC3
SCHEMBL4201252 0.76 ALDH1A1 (0.52) SLC6A2SLC6A4KDM4EALDH1A1L3MBTL1
SCHEMBL11295028 0.76 KDM4E (0.68) SLC6A2SLC6A4KDM4EALDH1A1AOC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 235 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116159341-A Three-dimensional porous wood-based monolithic column and preparation method thereof 北京林业大学 2023-05-26 CN claimed
CN-112759454-B Preparation method for preparing amino acid liquid surface fertilizer raw material from tanning chromium-containing leather scraps 烟台大学 2022-04-05 CN claimed
CN-113754859-A Amine-containing thioxanthone polyurethane modified epoxy acrylate LED photocuring resin 明光科迪新材料有限公司 2021-12-07 CN claimed
CN-113736092-A Hyperbranched LED resin modified by amine-containing thioxanthone photoinitiating group 吉力水性新材料科技(珠海)有限公司 2021-12-03 CN claimed
CN-113717370-A 2 nd-generation hyperbranched LED resin modified by amine-containing thioxanthone photoinitiating group 吉力水性新材料科技(珠海)有限公司 2021-11-30 CN claimed
CN-113717393-A 3 rd generation dendritic LED resin modified by amine-containing thioxanthone photoinitiating group 吉力水性新材料科技(珠海)有限公司 2021-11-30 CN claimed
EP-3059004-B1 METHOD FOR REMOVING SOX FROM GAS WITH COMPLEX ALCOHOL-AMINE SOLUTION BEIJING BOYUAN HENGSHENG HIGH TECH CO LTD (CN) 2021-06-30 EP claimed
CN-112759454-A Preparation method for preparing amino acid liquid surface fertilizer raw material from tanning chromium-containing leather scraps 烟台大学 2021-05-07 CN claimed
CN-109762315-B Unsaturated resin composition capable of being cured at room temperature and curing method thereof 常州百思通复合材料有限公司 2021-03-26 CN claimed
CN-108424291-B Preparation method for preparing amino acid liquid surface fertilizer raw material from tanning chromium-containing leather scraps 烟台大学 2021-02-05 CN claimed
CN-106031841-A Denitration technology and equipment for gas 北京博源恒升高科技有限公司 2016-10-19 CN claimed
CN-105732889-A Photosensitive resin and synthetic method thereof 深圳市容大感光科技股份有限公司 2016-07-06 CN claimed
EP-2861661-B1 CURING OF REACTION RESINS USING ASYMMETRIC AMINES AS ACCELERATORS EVONIK ROEHM GMBH (DE) 2016-04-20 EP claimed
EP-2861661-A1 CURING OF REACTION RESINS USING ASYMMETRIC AMINES AS ACCELERATORS Evonik Industries AG (DE) 2015-04-22 EP claimed
WO-2013185993-A1 CURING OF REACTION RESINS USING ASYMMETRIC AMINES AS ACCELERATORS EVONIK INDUSTRIES AG (DE) 2013-12-19 WO claimed
EP-0520226-B2 Halogen scavenger composition ST CHEMICAL CO LTD (JP) 2000-10-11 EP claimed
US-5866627-A UNSATURATED DERIVATIVES OF POLY(OXYDIPHENYLENE- AND P-PHENYLENE BIPHENYLENETETRACARBOXAMIC ACIDS), PHOTOPOLYMERIZABLE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-02-02 US claimed
EP-0119719-B1 RADIATION SENSITIVE POLYMER COMPOSITION TORAY INDUSTRIES, INC. (JP) 1987-05-06 EP claimed
US-4608333-A INCREASED PHOTOSENSITIVITY BY INCLUDING AN AROMATIC SECONDARY OR TERTIARY AMINE WITH AN ACRYLIC MONOMER AND A POLYIMIDE-CURING POLYAMIDE TORAY INDUSTRIES, INC. (JP) 1986-08-26 US claimed
EP-0119719-A1 Radiation sensitive polymer composition TORAY INDUSTRIES, INC. (JP) 1984-09-26 EP claimed