SCHEMBL167804

SCHEMBL167804

C=C/C(C)=C/C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17689575 1.00
SCHEMBL151424 1.00
SCHEMBL15609254 0.79 ALDH1A1 (0.52)
SCHEMBL11946653 0.79 ALDH1A1 (0.52)
SCHEMBL12494392 0.79 ALDH1A1 (0.52)
SCHEMBL6914384 0.79
SCHEMBL27616294 0.79 ALDH1A1 (0.50)
SCHEMBL6914385 0.79
SCHEMBL7197106 0.76 ALDH1A1 (0.41)
SCHEMBL20817010 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023162833-A1 ELECTRODE AND BATTERY パナソニックIPマネジメント株式会社 2023-08-31 WO claimed
EP-3553138-B1 CONDUCTIVE POLYMER COATINGS FOR THREE DIMENSIONAL SUBSTRATES HERAEUS MEDICAL COMPONENTS LLC (US) 2021-09-08 EP claimed
EP-3221404-B1 CONDUCTIVE POLYMER COATINGS FOR THREE DIMENSIONAL SUBSTRATES BIOTECTIX LLC (US) 2019-03-20 EP claimed
EP-2703407-B1 METHOD FOR MANUFACTURING PHOSPHONOCROTONIC ACID DERIVATIVE KOWA CO (JP) 2017-07-26 EP claimed
US-9540301-B2 Method for manufacturing phosphonocrotonic acid derivative KOWA COMPANY, LTD. (JP) 2017-01-10 US claimed
EP-2703407-A1 METHOD FOR MANUFACTURING PHOSPHONOCROTONIC ACID DERIVATIVE Kowa Company, Ltd. (JP) 2014-03-05 EP claimed
US-20140051876-A1 METHOD FOR MANUFACTURING PHOSPHONOCROTONIC ACID DERIVATIVE MANAC INCORPORATED (JP) 2014-02-20 US claimed
US-8551366-B2 Conductive composition and conductive cross-linked product, capacitor and production method thereof, and antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium SHIN-ETSU POLYMER CO., LTD. (JP) 2013-10-08 US claimed
US-8388866-B2 Conductive composition and conductive cross-linked product, capacitor and production method thereof, and antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium SHIN-ETSU POLYMER CO., LTD. (JP) 2013-03-05 US claimed
EP-4618745-A1 USE OF ISOTIANIL FOR CONTROLLING PLASMODIOPHORA BRASSICA Bayer Aktiengesellschaft (DE) 2025-09-24 EP disclosed
WO-2025132148-A1 ADJUVANT COMPOSITIONS FOR AGROCHEMICAL APPLICATIONS BAYER AKTIENGESELLSCHAFT (DE) 2025-06-26 WO disclosed
US-12019110-B2 Measurement system and radio wave blocking unit MAXELL, LTD. (JP) 2024-06-25 US disclosed
WO-2024104643-A1 USE OF ISOTIANIL FOR CONTROLLING PLASMODIOPHORA BRASSICA BAYER AKTIENGESELLSCHAFT (DE) 2024-05-23 WO disclosed
WO-2024048477-A1 DUODENAL PAPILLA MODEL デンカ株式会社 2024-03-07 WO disclosed
US-20080118669-A1 Antireflective film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2008-05-22 US disclosed
US-20080014505-A1 POLYMER ELECTROCHEMICAL DEVICE KURARAY CO., LTD. (JP) 2008-01-17 US disclosed
EP-1870597-A2 Polymer electrochemical device Kuraray Co., Ltd. (JP) 2007-12-26 EP disclosed
EP-1857504-A1 CONDUCTIVE-POLYMER SOLUTION, ANTISTATIC COATING MATERIAL, ANTISTATIC HARD COATING LAYER, OPTICAL FILTER, CONDUCTIVE COATING FILM, ANTISTATIC PRESSURE-SENSITIVE ADHESIVE, ANTISTATIC PRESSURE-SENSITIVE ADHESIVE LAYER, PROTECTIVE MATERIAL, AND PROCESS FOR PRODUCING THE SAME Shin-Etsu Polymer Co. Ltd. (JP) 2007-11-21 EP disclosed
US-20060202171-A1 Conductive polymer solution, antistatic coating material, antistatic hard coat layer, optical filter, conductive coating film, antistatic tacky adhesive, antistatic tacky adhesive layer, protective material, and method for producing the same SHIN-ETSU POLYMER CO., LTD. (JP) 2006-09-14 US disclosed
US-20060047030-A1 Conductive composition and conductive cross-linked product, capacitor and production method thereof, and antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium SHIN-ETSU POLYMER CO., LTD 2006-03-02 US disclosed