Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.68 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.68 |
| ▸ | LMNA | P02545 | 6/20 | 0.43 |
| ▸ | MAPT | P10636 | 5/20 | 0.43 |
| ▸ | POLB | P06746 | 5/20 | 0.43 |
| ▸ | MEN1 | O00255 | 4/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 4/20 | 0.40 |
| ▸ | XBP1 | P17861 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.35 |
| ▸ | PDK2 | Q15119 | 4/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.35 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29616931 | 1.00 | ESR1 (0.68) | ESR1ESR2LMNAMAPTPOLB | |
| SCHEMBL515744 | 0.91 | ESR1 (0.69) | ESR1ESR2LMNAMAPTPOLB | |
| SCHEMBL30806212 | 0.91 | ESR1 (0.69) | ESR1ESR2LMNAMAPTPOLB | |
| SCHEMBL29378579 | 0.91 | ESR1 (0.69) | ESR1ESR2LMNAMAPTPOLB | |
| SCHEMBL5448639 | 0.87 | ESR1 (0.58) | ESR1ESR2LMNAMAPTPOLB | |
| SCHEMBL29616926 | 0.87 | ESR1 (0.58) | ESR1ESR2LMNAMAPTPOLB | |
| SCHEMBL18386004 | 0.86 | ESR1 (0.63) | ESR1ESR2LMNAMAPTPOLB | |
| SCHEMBL10697013 | 0.85 | ESR1 (0.88) | ESR1ESR2LMNAMAPTPOLB | |
| Phenol SCHEMBL3001011 | 0.85 | ESR2 (0.61) | ESR1ESR2LMNAMAPTPOLB | |
| SCHEMBL7739556 | 0.83 | ESR1 (0.59) | ESR1ESR2LMNAMAPTPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3312224-B1 | POLYAMIDE MOULDING COMPOSITION AND MULTI-LAYERED STRUCTURE MADE HEREFROM | EMS PATENT AG (CH) | 2018-12-26 | — | — | EP | claimed |
| EP-3909744-B1 | ANTIREFLECTION FILM AND MULTILAYER FILM HAVING ANTIREFLECTION FILM | MITSUBISHI GAS CHEMICAL CO (JP) | 2026-03-11 | — | — | EP | disclosed |
| EP-3943987-B1 | ANTI-REFLECTION FILM LAMINATE, ANTI-REFLECTION FILM, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM LAMINATE | MITSUBISHI GAS CHEMICAL CO (JP) | 2025-09-03 | — | — | EP | disclosed |
| US-12163053-B2 | Antireflection film and multilayer film having antireflection film | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-12-10 | — | — | US | disclosed |
| US-20240240046-A1 | ANTIREFLECTION FILM, LAMINATE HAVING ANTIREFLECTION FILM, AND METHOD FOR MANUFACTURING ANTIREFLECTION FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-07-18 | — | — | US | disclosed |
| EP-4349589-A1 | ANTIREFLECTION FILM, LAMINATE HAVING ANTIREFLECTION FILM, AND METHOD FOR MANUFACTURING ANTIREFLECTION FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-10 | — | — | EP | disclosed |
| EP-3757625-B1 | ANTI-REFLECTION FILM AND LAYERED PRODUCT FILM HAVING ANTI-REFLECTION FILM | MITSUBISHI GAS CHEMICAL CO (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11926126-B2 | Anti-reflection film and layered product film having anti-reflection film | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-03-12 | — | — | US | disclosed |
| US-11884054-B2 | Anti-reflection film laminate, anti-reflection film, and method for manufacturing anti-reflection film laminate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| WO-2022255340-A1 | ANTIREFLECTION FILM, LAMINATE HAVING ANTIREFLECTION FILM, AND METHOD FOR MANUFACTURING ANTIREFLECTION FILM | 三菱瓦斯化学株式会社 | 2022-12-08 | — | — | WO | disclosed |
| EP-3943987-A1 | ANTI-REFLECTION FILM LAMINATE, ANTI-REFLECTION FILM, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM LAMINATE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-01-26 | — | — | EP | disclosed |
| EP-3909744-A1 | ANTIREFLECTION FILM AND MULTILAYER FILM HAVING ANTIREFLECTION FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-11-17 | — | — | EP | disclosed |
| US-20210053330-A1 | ANTI-REFLECTION FILM AND LAYERED PRODUCT FILM HAVING ANTI-REFLECTION FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-25 | — | — | US | disclosed |
| EP-3757625-A1 | ANTI-REFLECTION FILM AND LAYERED PRODUCT FILM HAVING ANTI-REFLECTION FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-30 | — | — | EP | disclosed |
| WO-2019163829-A1 | ANTI-REFLECTION FILM AND LAYERED PRODUCT FILM HAVING ANTI-REFLECTION FILM | 三菱瓦斯化学株式会社 | 2019-08-29 | — | — | WO | disclosed |
| EP-3312224-B1 | POLYAMIDE MOULDING COMPOSITION AND MULTI-LAYERED STRUCTURE MADE HEREFROM | EMS PATENT AG (CH) | 2018-12-26 | — | — | EP | disclosed |
| US-9448474-B2 | Positive photosensitive resin composition and pattern forming method | CHI MEI CORPORATION (TW) | 2016-09-20 | — | — | US | disclosed |
| US-9448474-B2 | Positive photosensitive resin composition and pattern forming method | CHI MEI CORPORATION (TW) | 2016-09-20 | — | — | US | disclosed |
| US-20150160554-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, THIN FILM TRANSISTOR ARRAY SUBSTRATE, AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2015-06-11 | — | — | US | disclosed |
| US-20150160554-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, THIN FILM TRANSISTOR ARRAY SUBSTRATE, AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2015-06-11 | — | — | US | disclosed |