⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14121035 | 0.86 | — | — | |
| SCHEMBL15615111 | 0.84 | — | — | |
| SCHEMBL2506726 | 0.84 | — | — | |
| SCHEMBL1069202 | 0.80 | ALDH1A1 (0.35) | — | |
| SCHEMBL12197708 | 0.77 | — | — | |
| SCHEMBL18253569 | 0.76 | MAPT (0.36) | — | |
| SCHEMBL2507711 | 0.75 | — | — | |
| SCHEMBL10064092 | 0.75 | ALDH1A1 (0.38) | — | |
| SCHEMBL16840291 | 0.74 | — | — | |
| SCHEMBL25278 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9957339-B2 | Copolymer and associated layered article, and device-forming method | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-05-01 | — | — | US | disclosed |
| US-9815930-B2 | Block copolymer and associated photoresist composition and method of forming an electronic device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-11-14 | — | — | US | disclosed |
| US-9758610-B2 | Acid-labile hyperbranched copolymer and associated photoresist composition and method of forming an electronic device | DOW GLOBAL TECHNOLOGIES LLC (US) | 2017-09-12 | — | — | US | disclosed |
| US-20170174808-A1 | ACID-LABILE HYPERBRANCHED COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD OF FORMING AN ELECTRONIC DEVICE | DOW GLOBAL TECHNOLOGIES LLC | 2017-06-22 | — | — | US | disclosed |
| US-9581901-B2 | Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-02-28 | — | — | US | disclosed |
| US-20170037178-A1 | BLOCK COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD OF FORMING AN ELECTRONIC DEVICE | THE UNIVERSITY OF QUEENSLAND (AU) | 2017-02-09 | — | — | US | disclosed |
| US-20170037171-A1 | COPOLYMER AND ASSOCIATED LAYERED ARTICLE, AND DEVICE-FORMING METHOD | THE UNIVERSITY OF QUEENSLAND (AU) | 2017-02-09 | — | — | US | disclosed |
| US-9229319-B2 | Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-01-05 | — | — | US | disclosed |
| US-9182669-B2 | Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-11-10 | — | — | US | disclosed |
| US-20150177614-A1 | COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-06-25 | — | — | US | disclosed |
| US-20150177615-A1 | PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-06-25 | — | — | US | disclosed |
| US-20150177613-A1 | PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-06-25 | — | — | US | disclosed |