Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.48 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.42 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.39 |
| ▸ | IDO1 | P14902 | 2/20 | 0.39 |
| ▸ | PDPK1 | O15530 | 1/20 | 0.39 |
| ▸ | MMP1 | P03956 | 1/20 | 0.38 |
| ▸ | MMP2 | P08253 | 1/20 | 0.38 |
| ▸ | MMP9 | P14780 | 1/20 | 0.38 |
| ▸ | MMP8 | P22894 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7221545 | 0.81 | ALDH1A1 (0.46) | — | |
| Methyl Alcohol SCHEMBL14815578 | 0.75 | PRCP (0.49) | IDO1PDPK1 | |
| SCHEMBL19838830 | 0.75 | PDPK1 (0.47) | IDO1PDPK1 | |
| SCHEMBL30298337 | 0.74 | PRCP (0.52) | IDO1PDPK1 | |
| SCHEMBL835606 | 0.74 | PRCP (0.52) | IDO1PDPK1 | |
| SCHEMBL30298334 | 0.74 | PRCP (0.52) | IDO1PDPK1 | |
| SCHEMBL7678037 | 0.72 | PDPK1 (0.44) | PIN1IDO1PDPK1 | |
| SCHEMBL11498923 | 0.72 | HTR2A (0.52) | IDO1PDPK1 | |
| SCHEMBL5748401 | 0.72 | PDPK1 (0.47) | IDO1PDPK1 | |
| SCHEMBL21465991 | 0.72 | PDPK1 (0.47) | IDO1PDPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |