Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB2 | P17787 | 1/20 | 0.65 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.65 |
| ▸ | CNR1 | P21554 | 2/20 | 0.60 |
| ▸ | CNR2 | P34972 | 2/20 | 0.60 |
| ▸ | DRD2 | P14416 | 1/20 | 0.56 |
| ▸ | DRD4 | P21917 | 1/20 | 0.56 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.56 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.56 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.56 |
| ▸ | DRD3 | P35462 | 1/20 | 0.56 |
| ▸ | PRSS1 | P07477 | 6/20 | 0.55 |
| ▸ | APP | P05067 | 1/20 | 0.55 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.52 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.52 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16902848 | 1.00 | CHRNB2 (0.65) | CHRNB2CHRNA4CNR1CNR2DRD2 | |
| SCHEMBL16902831 | 1.00 | CHRNB2 (0.65) | CHRNB2CHRNA4CNR1CNR2DRD2 | |
| SCHEMBL16902833 | 1.00 | CHRNB2 (0.65) | CHRNB2CHRNA4CNR1CNR2DRD2 | |
| SCHEMBL16902829 | 1.00 | CHRNB2 (0.65) | CHRNB2CHRNA4CNR1CNR2DRD2 | |
| SCHEMBL16902832 | 1.00 | CHRNB2 (0.65) | CHRNB2CHRNA4CNR1CNR2DRD2 | |
| SCHEMBL9009814 | 1.00 | CHRNB2 (0.65) | CHRNB2CHRNA4CNR1CNR2DRD2 | |
| SCHEMBL11243720 | 1.00 | CHRNB2 (0.65) | CHRNB2CHRNA4CNR1CNR2DRD2 | |
| SCHEMBL9126822 | 1.00 | CHRNB2 (0.65) | CHRNB2CHRNA4CNR1CNR2DRD2 | |
| SCHEMBL7089196 | 0.98 | CHRNB2 (0.67) | CHRNB2CHRNA4CNR1CNR2DRD2 | |
| SCHEMBL11231915 | 0.93 | CHRNB2 (0.67) | CHRNB2CHRNA4CNR1CNR2DRD2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |