Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNA3 | P22001 | 1/20 | 0.79 |
| ▸ | HTR1B | P28222 | 9/20 | 0.75 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.71 |
| ▸ | HRH1 | P35367 | 1/20 | 0.68 |
| ▸ | HRH3 | Q9Y5N1 | 4/20 | 0.66 |
| ▸ | HTR2A | P28223 | 2/20 | 0.66 |
| ▸ | HTR7 | P34969 | 2/20 | 0.66 |
| ▸ | HTR6 | P50406 | 2/20 | 0.66 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.65 |
| ▸ | HTR1D | P28221 | 1/20 | 0.65 |
| ▸ | NR2E1 | Q9Y466 | 1/20 | 0.62 |
| ▸ | MEN1 | O00255 | 1/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.59 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16902839 | 1.00 | KCNA3 (0.79) | KCNA3HTR1BSLC6A4HRH1HRH3 | |
| SCHEMBL16902853 | 1.00 | KCNA3 (0.79) | KCNA3HTR1BSLC6A4HRH1HRH3 | |
| SCHEMBL11337403 | 1.00 | KCNA3 (0.79) | KCNA3HTR1BSLC6A4HRH1HRH3 | |
| SCHEMBL16902855 | 1.00 | KCNA3 (0.79) | KCNA3HTR1BSLC6A4HRH1HRH3 | |
| SCHEMBL16902854 | 1.00 | KCNA3 (0.79) | KCNA3HTR1BSLC6A4HRH1HRH3 | |
| SCHEMBL16902840 | 1.00 | KCNA3 (0.79) | KCNA3HTR1BSLC6A4HRH1HRH3 | |
| SCHEMBL16902863 | 1.00 | KCNA3 (0.79) | KCNA3HTR1BSLC6A4HRH1HRH3 | |
| SCHEMBL16902849 | 1.00 | KCNA3 (0.79) | KCNA3HTR1BSLC6A4HRH1HRH3 | |
| SCHEMBL9770352 | 0.98 | KCNA3 (0.81) | KCNA3HTR1BSLC6A4HRH1HRH3 | |
| SCHEMBL2177350 | 0.93 | HTR1B (0.78) | KCNA3HTR1BSLC6A4HRH1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |