Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR1B | P28222 | 12/20 | 0.78 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.75 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.70 |
| ▸ | HRH1 | P35367 | 1/20 | 0.70 |
| ▸ | HTR1D | P28221 | 2/20 | 0.67 |
| ▸ | NR2E1 | Q9Y466 | 1/20 | 0.64 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.62 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.60 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9770352 | 0.95 | KCNA3 (0.81) | HTR1BKCNA3SLC6A4HRH1HTR1D | |
| SCHEMBL11337403 | 0.93 | KCNA3 (0.79) | HTR1BKCNA3SLC6A4HRH1HTR1D | |
| SCHEMBL16902849 | 0.93 | KCNA3 (0.79) | HTR1BKCNA3SLC6A4HRH1HTR1D | |
| SCHEMBL16902863 | 0.93 | KCNA3 (0.79) | HTR1BKCNA3SLC6A4HRH1HTR1D | |
| SCHEMBL16902853 | 0.93 | KCNA3 (0.79) | HTR1BKCNA3SLC6A4HRH1HTR1D | |
| SCHEMBL16902854 | 0.93 | KCNA3 (0.79) | HTR1BKCNA3SLC6A4HRH1HTR1D | |
| SCHEMBL16902840 | 0.93 | KCNA3 (0.79) | HTR1BKCNA3SLC6A4HRH1HTR1D | |
| SCHEMBL16902855 | 0.93 | KCNA3 (0.79) | HTR1BKCNA3SLC6A4HRH1HTR1D | |
| SCHEMBL16902852 | 0.93 | KCNA3 (0.79) | HTR1BKCNA3SLC6A4HRH1HTR1D | |
| SCHEMBL16902839 | 0.93 | KCNA3 (0.79) | HTR1BKCNA3SLC6A4HRH1HTR1D |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| EP-1832434-B2 | HEAT-SENSITIVE RECORDING MATERIAL | OJI PAPER CO (JP) | 2014-08-13 | — | — | EP | disclosed |
| EP-2223809-B1 | Method for producing a heat-sensitive recording material | OJI PAPER CO (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-7972991-B2 | Heat-sensitive recording material | OJI PAPER CO., LTD. (JP) | 2011-07-05 | — | — | US | disclosed |
| EP-2223809-A1 | Method for producing a heat-sensitive recording material | Oji Paper Co., Ltd. (JP) | 2010-09-01 | — | — | EP | disclosed |
| US-7709416-B2 | Heat-sensitive recording material | OJI PAPER CO., LTD. (JP) | 2010-05-04 | — | — | US | disclosed |
| US-7674748-B2 | 4-hydroxy-4′-isopropoxydiphenyl sulfone developer dispersion, method of wet grinding, and thermal recording media | OJI PAPER CO., LTD. (JP) | 2010-03-09 | — | — | US | disclosed |
| EP-1726450-B1 | 4-HYDROXY-4' -ISOPROPOXYDIPHENYL SULFONE DEVELOPER DISPERSION, METHOD OF WET GRINDING, AND THERMAL RECORDING MEDIA | OJI PAPER CO (JP) | 2008-10-29 | — | — | EP | disclosed |
| EP-1918118-A1 | THERMOSENSITIVE RECORDING MATERIAL AND PROCESS FOR PRODUCTION THEREOF | OJI PAPER COMPANY LIMITED (JP) | 2008-05-07 | — | — | EP | disclosed |
| US-20080103041-A1 | Heat-Sensitive Recording Material | OJI PAPER CO., LTD. (JP) | 2008-05-01 | — | — | US | disclosed |
| US-20070270309-A1 | Heat-Sensitive Recording Material | OJI PAPER CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| CN-101056769-A | Heat-sensitive recording material | OJI PAPER CO (JP) | 2007-10-17 | — | — | CN | disclosed |
| EP-1832434-A1 | HEAT-SENSITIVE RECORDING MATERIAL | Oji Paper Co., Ltd. (JP) | 2007-09-12 | — | — | EP | disclosed |
| US-20070191226-A1 | 4-Hydroxy -4'-isopropoxydiphenyl sulfone developer dispersion, method of wet grinding, and thermal recording media | OJI PAPER CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| EP-1808304-A1 | HEAT-SENSITIVE RECORDING MATERIAL | Oji Paper Co., Ltd. (JP) | 2007-07-18 | — | — | EP | disclosed |
| US-20070111888-A1 | Heat-sensitive recording material and process for producing the same | OJI PAPER CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| EP-1726450-A1 | 4-HYDROXY-4 -ISOPROPOXYDIPHENYL SULFONE DEVELOPER DISPERSION, METHOD OF WET GRINDING, AND THERMAL RECORDING MEDIA | OJI PAPER COMPANY LIMITED (JP) | 2006-11-29 | — | — | EP | disclosed |