Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.73 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.73 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.73 |
| ▸ | HRH3 | Q9Y5N1 | 7/20 | 0.65 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.65 |
| ▸ | NPC1 | O15118 | 3/20 | 0.64 |
| ▸ | RAB9A | P51151 | 3/20 | 0.64 |
| ▸ | AGXT | P21549 | 2/20 | 0.63 |
| ▸ | MAPT | P10636 | 2/20 | 0.61 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.61 |
| ▸ | HTT | P42858 | 1/20 | 0.59 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.59 |
| ▸ | DRD3 | P35462 | 1/20 | 0.57 |
| ▸ | PPARG | P37231 | 2/20 | 0.56 |
| ▸ | PTPN7 | P35236 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16902857 | 1.00 | TDP1 (0.73) | TDP1KDM4EMAPK1HRH3HDAC1 | |
| SCHEMBL16902850 | 1.00 | TDP1 (0.73) | TDP1KDM4EMAPK1HRH3HDAC1 | |
| SCHEMBL16902865 | 1.00 | TDP1 (0.73) | TDP1KDM4EMAPK1HRH3HDAC1 | |
| SCHEMBL16902856 | 1.00 | TDP1 (0.73) | TDP1KDM4EMAPK1HRH3HDAC1 | |
| SCHEMBL16902859 | 1.00 | TDP1 (0.73) | TDP1KDM4EMAPK1HRH3HDAC1 | |
| SCHEMBL16902870 | 1.00 | TDP1 (0.73) | TDP1KDM4EMAPK1HRH3HDAC1 | |
| SCHEMBL16902871 | 1.00 | TDP1 (0.73) | TDP1KDM4EMAPK1HRH3HDAC1 | |
| SCHEMBL8565990 | 0.98 | TDP1 (0.76) | TDP1KDM4EMAPK1HRH3HDAC1 | |
| SCHEMBL3772195 | 0.94 | TDP1 (0.66) | TDP1KDM4EMAPK1HRH3HDAC1 | |
| SCHEMBL29429997 | 0.93 | TDP1 (0.76) | TDP1KDM4EMAPK1HRH3HDAC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |