SCHEMBL8565990

SCHEMBL8565990

c1ccc2cc(OCCCCOc3ccc4ccccc4c3)ccc2c1

nearest known ligand 0.76

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.76
KDM4E B2RXH2 2/20 0.76
MAPK1 P28482 1/20 0.76
NPC1 O15118 3/20 0.66
RAB9A P51151 3/20 0.66
AGXT P21549 2/20 0.65
MAPT P10636 2/20 0.63
SMN1; SMN2 Q16637 1/20 0.63
HRH3 Q9Y5N1 7/20 0.62
HDAC1 Q13547 1/20 0.62
ALOX5 P09917 1/20 0.61
HTT P42858 1/20 0.61
DRD3 P35462 1/20 0.59
PPARG P37231 2/20 0.58
PTPN7 P35236 1/20 0.57
LMNA P02545 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16902865 0.98 TDP1 (0.73) TDP1KDM4EMAPK1NPC1RAB9A
SCHEMBL16902857 0.98 TDP1 (0.73) TDP1KDM4EMAPK1NPC1RAB9A
SCHEMBL16902871 0.98 TDP1 (0.73) TDP1KDM4EMAPK1NPC1RAB9A
SCHEMBL16902850 0.98 TDP1 (0.73) TDP1KDM4EMAPK1NPC1RAB9A
SCHEMBL16902856 0.98 TDP1 (0.73) TDP1KDM4EMAPK1NPC1RAB9A
SCHEMBL16902870 0.98 TDP1 (0.73) TDP1KDM4EMAPK1NPC1RAB9A
SCHEMBL16902859 0.98 TDP1 (0.73) TDP1KDM4EMAPK1NPC1RAB9A
SCHEMBL16902858 0.98 TDP1 (0.73) TDP1KDM4EMAPK1NPC1RAB9A
SCHEMBL29429997 0.95 TDP1 (0.76) TDP1KDM4EMAPK1NPC1RAB9A
SCHEMBL1859481 0.95 TDP1 (0.76) TDP1KDM4EMAPK1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-10100534-A None JP disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
JP-H10100534-A THERMOSENSITIVE RECORDING MEDIUM AND ITS USING METHOD OJI PAPER CO LTD 1998-04-21 JP disclosed