SCHEMBL16902877

SCHEMBL16902877

OCc1ccc(OCCCOc2ccc(CO)cc2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 4/20 0.59
LTA4H P09960 1/20 0.52
TMPRSS2 O15393 1/20 0.48
PRSS1 P07477 2/20 0.47
FURIN P09958 1/20 0.47
ALDH1A1 P00352 3/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
LMNA P02545 2/20 0.46
MAPT P10636 1/20 0.46
HPGD P15428 1/20 0.46
RECQL P46063 1/20 0.44
KCNA3 P22001 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.43
CYSLTR1 Q9Y271 1/20 0.43
MEN1 O00255 1/20 0.43
USP2 O75604 1/20 0.43
CYP3A4 P08684 1/20 0.43
MAPK1 P28482 1/20 0.43
CASP1 P29466 1/20 0.43
KMT2A Q03164 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8545935 0.95 HRH3 (0.59) HRH3LTA4HTMPRSS2PRSS1KCNA3
SCHEMBL8369936 0.93 HRH3 (0.58) HRH3LTA4HTMPRSS2PRSS1ALDH1A1
SCHEMBL16902874 0.93 HRH3 (0.58) HRH3LTA4HTMPRSS2PRSS1ALDH1A1
SCHEMBL10710138 0.93 HRH3 (0.58) HRH3LTA4HTMPRSS2PRSS1ALDH1A1
SCHEMBL16902872 0.93 HRH3 (0.58) HRH3LTA4HTMPRSS2PRSS1ALDH1A1
SCHEMBL16902880 0.93 HRH3 (0.58) HRH3LTA4HTMPRSS2PRSS1ALDH1A1
SCHEMBL16902868 0.93 HRH3 (0.58) HRH3LTA4HTMPRSS2PRSS1ALDH1A1
SCHEMBL16902883 0.93 HRH3 (0.58) HRH3LTA4HTMPRSS2PRSS1ALDH1A1
SCHEMBL16902866 0.93 HRH3 (0.58) HRH3LTA4HTMPRSS2PRSS1ALDH1A1
SCHEMBL16902867 0.93 HRH3 (0.58) HRH3LTA4HTMPRSS2PRSS1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed