SCHEMBL8545935

SCHEMBL8545935

OCc1ccc(OCCCCOc2ccc(CO)cc2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 2/20 0.59
LTA4H P09960 1/20 0.52
KCNA3 P22001 1/20 0.50
PRSS1 P07477 2/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
CYSLTR1 Q9Y271 1/20 0.47
PRMT1 Q99873 3/20 0.47
F2 P00734 2/20 0.47
ST14 Q9Y5Y6 2/20 0.47
PLAU P00749 1/20 0.47
GAA P10253 1/20 0.47
PRMT5 O14744 1/20 0.47
NR5A1 Q13285 1/20 0.47
SLC22A2 O15244 1/20 0.47
SLC22A1 O15245 1/20 0.47
TMPRSS2 O15393 1/20 0.47
PTP4A3 O75365 1/20 0.47
SLC22A3 O75751 1/20 0.47
F10 P00742 1/20 0.47
PLG P00747 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16902868 0.98 HRH3 (0.58) HRH3LTA4HKCNA3PRSS1L3MBTL1
SCHEMBL16902872 0.98 HRH3 (0.58) HRH3LTA4HKCNA3PRSS1L3MBTL1
SCHEMBL16902883 0.98 HRH3 (0.58) HRH3LTA4HKCNA3PRSS1L3MBTL1
SCHEMBL16902874 0.98 HRH3 (0.58) HRH3LTA4HKCNA3PRSS1L3MBTL1
SCHEMBL16902866 0.98 HRH3 (0.58) HRH3LTA4HKCNA3PRSS1L3MBTL1
SCHEMBL16902880 0.98 HRH3 (0.58) HRH3LTA4HKCNA3PRSS1L3MBTL1
SCHEMBL10710138 0.98 HRH3 (0.58) HRH3LTA4HKCNA3PRSS1L3MBTL1
SCHEMBL8369936 0.98 HRH3 (0.58) HRH3LTA4HKCNA3PRSS1L3MBTL1
SCHEMBL16902867 0.98 HRH3 (0.58) HRH3LTA4HKCNA3PRSS1L3MBTL1
SCHEMBL16902877 0.95 HRH3 (0.59) HRH3LTA4HKCNA3PRSS1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10007183-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-26 US disclosed
US-10007183-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-26 US disclosed
US-9977330-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-22 US disclosed
US-9977330-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-22 US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-9261788-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-16 US disclosed
US-9261788-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-16 US disclosed
US-20160027653-A1 COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-28 US disclosed
US-20160027653-A1 COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-28 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
EP-0696585-B1 NOVEL BISOXADIAZOLIDINE DERIVATIVE YAMANOUCHI PHARMA CO LTD (JP) 1998-12-16 EP disclosed
US-5643931-A ANTIDIABETIC AGENTS YAMANOUCHI PHARMACEUTICAL CO., LTD. (JP) 1997-07-01 US disclosed
EP-0696585-A1 NOVEL BISOXADIAZOLIDINE DERIVATIVE YAMANOUCHI PHARMACEUTICAL CO. LTD. (JP) 1996-02-14 EP disclosed
EP-0228803-B1 IONENE ELASTOMERS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-09-16 EP disclosed
US-4794031-A POLYMERIC DIAMINES, DIHALIDE LINKING AGENTS, POLYETHERS, ACRYLIC COPOLYMERS, ENCAPPING MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1988-12-27 US disclosed
US-4734458-A QUATERNIZED POLYAMINES MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1988-03-29 US disclosed
EP-0228803-A2 Ionene elastomers MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1987-07-15 EP disclosed
US-4677182-A COATINGS, ADHESIVES MINNESOTA MINING AND MANUFACTURING CO. (US) 1987-06-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10007183-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process OR10J3, RER1, OLA1 HRH3 85/4885LTA4H 1757/4885KCNA3 193/4885
US-20160027653-A1 COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS OR10J3, RER1, OLA1 HRH3 85/4885LTA4H 1757/4885KCNA3 193/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.