Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP15 | Q460N3 | 4/20 | 0.56 |
| ▸ | PARP10 | Q53GL7 | 4/20 | 0.56 |
| ▸ | PARP2 | Q9UGN5 | 2/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | ACACB | O00763 | 1/20 | 0.46 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.45 |
| ▸ | EP300 | Q09472 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1391172 | 1.00 | PARP15 (0.56) | PARP15PARP10PARP2TDP1ACACB | |
| SCHEMBL4525743 | 1.00 | PARP15 (0.56) | PARP15PARP10PARP2TDP1ACACB | |
| SCHEMBL1391184 | 0.92 | PARP15 (0.58) | PARP15PARP10PARP2TDP1 | |
| SCHEMBL18406627 | 0.91 | PARP10 (0.59) | PARP15PARP10PARP2 | |
| SCHEMBL1391095 | 0.91 | PARP10 (0.59) | PARP15PARP10PARP2 | |
| SCHEMBL29024848 | 0.85 | PARP15 (0.64) | PARP15PARP10PARP2TDP1SIGMAR1 | |
| SCHEMBL17050499 | 0.85 | PARP15 (0.53) | PARP15PARP10PARP2TDP1ACACB | |
| SCHEMBL20420997 | 0.81 | PARP15 (0.47) | PARP15PARP10PARP2 | |
| SCHEMBL1390849 | 0.81 | NFE2L2 (0.53) | ACACB | |
| SCHEMBL23266204 | 0.80 | PARP15 (0.49) | PARP15PARP10PARP2ACACB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |