SCHEMBL16902890

SCHEMBL16902890

CC(COc1ccc(CO)cc1)Oc1ccc(CO)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 2/20 0.41
PPARA Q07869 2/20 0.41
LTA4H P09960 2/20 0.41
LMNA P02545 1/20 0.40
POLB P06746 2/20 0.40
CYP2C9 P11712 1/20 0.40
TSHR P16473 1/20 0.40
MAPT P10636 2/20 0.39
ACACB O00763 1/20 0.39
ACACA Q13085 1/20 0.39
MEN1 O00255 1/20 0.39
ALOX12 P18054 1/20 0.39
KMT2A Q03164 1/20 0.39
HRH3 Q9Y5N1 1/20 0.38
HPGD P15428 1/20 0.38
XBP1 P17861 1/20 0.38
ADRB2 P07550 2/20 0.38
ADRB1 P08588 2/20 0.38
ADRB3 P13945 1/20 0.38
NR3C1 P04150 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8048422 0.82 MAPT (0.53) LTA4HLMNAPOLBCYP2C9MAPT
SCHEMBL2473518 0.81 SLC6A2 (0.53) LTA4HLMNAMEN1KMT2AADRB2
SCHEMBL31664416 0.81 ACACB (0.48) PPARGPPARALTA4HLMNAPOLB
SCHEMBL1628642 0.81 LMNA (0.62) PPARGPPARALTA4HLMNAPOLB
SCHEMBL12129217 0.81 CYP2C9 (0.44) PPARGPPARALTA4HLMNAPOLB
SCHEMBL9768738 0.79 NQO1 (0.48) PPARGPPARALTA4HLMNATSHR
SCHEMBL418159 0.79 CYP2C9 (0.52) POLBCYP2C9TSHRMAPTMEN1
SCHEMBL9768614 0.79 NQO1 (0.58) LTA4HLMNATSHRMAPTHPGD
SCHEMBL8641671 0.79 USP2 (0.46) LMNACYP2C9TSHRMAPTMEN1
SCHEMBL728462 0.78 POLB (0.60) PPARGPPARALTA4HLMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed