SCHEMBL1697244

SCHEMBL1697244

CCCC(F)(F)C(F)(F)S(=O)(=O)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9968679 0.89 EPHX1 (0.33)
SCHEMBL776005 0.77 FAAH (0.30)
SCHEMBL15702986 0.73 EPHX1 (0.32)
Ammonia Solution, Strong SCHEMBL18008823 0.71 EPHX1 (0.31)
Lithium Ion SCHEMBL18008531 0.71 KCNH2 (0.30)
Potassium Ion SCHEMBL18008421 0.71 KCNH2 (0.30)
SCHEMBL18008572 0.71 KCNH2 (0.30)
SCHEMBL4297517 0.71 USP2 (0.35)
SCHEMBL781139 0.71 USP2 (0.35)
Butane SCHEMBL748065 0.70 EPHX1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8431326-B2 Salt and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-30 US disclosed
US-20120088190-A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-04-12 US disclosed