Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | KIF11 | P52732 | 1/20 | 0.31 |
| ▸ | THRA | P10827 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15356197 | 0.94 | ESR1 (0.38) | ESR1ESR2KDM4EMEN1LMNA | |
| SCHEMBL15356196 | 0.91 | ESR1 (0.34) | ESR1ESR2KDM4EMEN1LMNA | |
| SCHEMBL16994999 | 0.91 | ESR1 (0.40) | ESR1ESR2KDM4EMEN1LMNA | |
| SCHEMBL4126295 | 0.87 | ESR1 (0.40) | ESR1ESR2KDM4EMEN1LMNA | |
| SCHEMBL4134601 | 0.82 | ESR1 (0.41) | ESR1ESR2KDM4EMEN1LMNA | |
| SCHEMBL15356199 | 0.80 | CNR2 (0.35) | ESR1ESR2KDM4EMEN1LMNA | |
| SCHEMBL15926113 | 0.80 | ESR1 (0.43) | ESR1ESR2KDM4EMEN1LMNA | |
| SCHEMBL16118003 | 0.79 | PDK2 (0.38) | ESR1ESR2MAPTTHRB | |
| SCHEMBL15356205 | 0.79 | ESR1 (0.39) | ESR1ESR2KDM4EMEN1LMNA | |
| SCHEMBL15356191 | 0.78 | THRB (0.56) | ESR1ESR2KDM4EMEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2664628-B1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK | MARUZEN PETROCHEM CO LTD (JP) | 2015-08-12 | — | — | EP | disclosed |