Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.66 |
| ▸ | MAPT | P10636 | 3/20 | 0.66 |
| ▸ | HPGD | P15428 | 2/20 | 0.66 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.66 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.66 |
| ▸ | RECQL | P46063 | 1/20 | 0.66 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.66 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.66 |
| ▸ | GAA | P10253 | 2/20 | 0.66 |
| ▸ | MEN1 | O00255 | 1/20 | 0.66 |
| ▸ | USP2 | O75604 | 1/20 | 0.66 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.66 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.66 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.56 |
| ▸ | PGR | P06401 | 1/20 | 0.56 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.56 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.56 |
| ▸ | PDE4A | P27815 | 1/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30063117 | 1.00 | LMNA (0.66) | LMNAMAPTHPGDKDM4ECYP3A4 | |
| SCHEMBL7046942 | 0.96 | KMT2A (0.70) | LMNAMAPTHPGDKDM4ECYP3A4 | |
| SCHEMBL295850 | 0.93 | KMT2A (0.68) | LMNAMAPTHPGDKDM4ECYP3A4 | |
| SCHEMBL7437398 | 0.91 | GAA (0.64) | LMNAMAPTHPGDKDM4ECYP3A4 | |
| SCHEMBL10166785 | 0.86 | KMT2A (0.59) | LMNAMAPTHPGDKDM4ECYP3A4 | |
| SCHEMBL11224029 | 0.84 | LMNA (0.58) | LMNAMAPTHPGDKDM4ECYP3A4 | |
| SCHEMBL10876036 | 0.84 | MAPT (0.58) | LMNAMAPTHPGDKDM4ECYP3A4 | |
| SCHEMBL29043224 | 0.84 | KMT2A (0.58) | LMNAMAPTHPGDKDM4ECYP3A4 | |
| SCHEMBL8649520 | 0.84 | KMT2A (0.58) | LMNAMAPTHPGDKDM4ECYP3A4 | |
| SCHEMBL29722775 | 0.84 | LMNA (0.58) | LMNAMAPTHPGDKDM4ECYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7517838-B2 | Lubricating oil for bearing | NEW JAPAN CHEMICAL CO., LTD. (JP) | 2009-04-14 | — | — | US | claimed |
| US-20060019840-A1 | Lubricating oil for bearing | NEW JAPAN CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | claimed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | claimed |
| US-12339586-B2 | Photocurable resin composition containing self-crosslinkable polymer | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-24 | — | — | US | disclosed |
| US-20250116936-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-10 | — | — | US | disclosed |
| EP-4485077-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKING POLYMER | Nissan Chemical Corporation (JP) | 2025-01-01 | — | — | EP | disclosed |
| WO-2023162968-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKING POLYMER | 日産化学株式会社 | 2023-08-31 | — | — | WO | disclosed |
| EP-3901130-B1 | LUBRICATING BASE OIL FOR FLUID DYNAMIC BEARING | NEW JAPAN CHEM CO LTD (JP) | 2023-07-12 | — | — | EP | disclosed |
| CN-108732868-B | Positive resist film laminate and pattern forming method | 信越化学工业株式会社 | 2022-12-13 | — | — | CN | disclosed |
| CN-115216356-A | Base oil for fluid dynamic bearing lubricant, fluid dynamic bearing, motor, and fan motor | 日本电产株式会社 | 2022-10-21 | — | — | CN | disclosed |
| US-20220333031-A1 | FLUID DYNAMIC BEARING LUBRICATING OIL BASE OIL, FLUID DYNAMIC BEARING LUBRICATING OIL, FLUID DYNAMIC BEARING, MOTOR, AND FAN MOTOR | NIDEC CORPORATION (JP) | 2022-10-20 | — | — | US | disclosed |
| EP-0848289-A1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-17 | — | — | EP | disclosed |
| US-5686557-A | Polyamide resin which can be dissolved in alcohol solvent, composition thereof, and method of use thereof | TOMOEGAWA PAPER CO., LTD. (JP) | 1997-11-11 | — | — | US | disclosed |
| CN-1161693-A | Synthetic lubricating oil | KAO CORP (JP) | 1997-10-08 | — | — | CN | disclosed |
| EP-0779289-A1 | SYNTHETIC LUBRICATING OIL | Kao Corporation (JP) | 1997-06-18 | — | — | EP | disclosed |
| US-5599653-A | USING AS UNDERCOATING LAYER A GLYCIDYL METHACRYLATE-METHYL METHACRYLATE COPOLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-02-04 | — | — | US | disclosed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| US-5498514-A | GLYCIDYL METHACRYLATE-METHYL METHACARYLATE COPOLYMER, TETRAHYDROXYBENZOPHENONE | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-12 | — | — | US | disclosed |
| US-5395544-A | Ester-containing working fluid composition for refrigerating machine | KAO CORPORATION (JP) | 1995-03-07 | — | — | US | disclosed |
| EP-0580308-A1 | Working fluid composition for refrigeration machine | KAO CORPORATION (JP) | 1994-01-26 | — | — | EP | disclosed |