⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8445884 | 0.72 | — | — | |
| SCHEMBL14062615 | 0.72 | — | — | |
| SCHEMBL86833 | 0.70 | — | — | |
| SCHEMBL950154 | 0.69 | — | — | |
| SCHEMBL476751 | 0.69 | — | — | |
| SCHEMBL4178811 | 0.69 | — | — | |
| SCHEMBL3378383 | 0.67 | — | — | |
| SCHEMBL3371415 | 0.67 | — | — | |
| SCHEMBL6296272 | 0.67 | — | — | |
| SCHEMBL2428134 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11566177-B2 | Dry etching agent, dry etching method and method for producing semiconductor device | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-01-31 | — | — | US | claimed |
| US-20190345385-A1 | Dry Etching Agent, Dry Etching Method and Method for Producing Semiconductor Device | CENTRAL GLASS COMPANY, LIMITED (JP) | 2019-11-14 | — | — | US | claimed |
| US-11566177-B2 | Dry etching agent, dry etching method and method for producing semiconductor device | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-01-31 | — | — | US | disclosed |
| US-20190345385-A1 | Dry Etching Agent, Dry Etching Method and Method for Producing Semiconductor Device | CENTRAL GLASS COMPANY, LIMITED (JP) | 2019-11-14 | — | — | US | disclosed |
| US-20160336614-A1 | CELL, CELL PACK, ELECTRONIC DEVICE, ELECTRIC VEHICLE, ELECTRICITY STORAGE APPARATUS, AND POWER SYSTEM | MURATA MANUFACTURING CO., LTD. (JP) | 2016-11-17 | — | — | US | disclosed |
| US-9455476-B2 | Electrolyte and secondary battery | SONY CORPORATION (JP) | 2016-09-27 | — | — | US | disclosed |
| US-9118062-B2 | Anode and method of manufacturing the same, and battery and method of manufacturing the same | SONY CORPORATION (JP) | 2015-08-25 | — | — | US | disclosed |