⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1090946 | 0.81 | — | — | |
| SCHEMBL11797469 | 0.81 | — | — | |
| SCHEMBL8613460 | 0.78 | LMNA (0.35) | — | |
| SCHEMBL8615233 | 0.78 | LMNA (0.35) | — | |
| SCHEMBL13917505 | 0.72 | — | — | |
| SCHEMBL5844557 | 0.72 | — | — | |
| SCHEMBL4129803 | 0.72 | — | — | |
| SCHEMBL86833 | 0.70 | — | — | |
| SCHEMBL17029344 | 0.69 | — | — | |
| SCHEMBL14510833 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240158392-A1 | SMALL MOLECULE INHIBITORS OF SALT INDUCIBLE KINASES | JANSSEN RESEARCH & DEVELOPMENT, LLC | 2024-05-16 | — | — | US | disclosed |
| EP-4353705-A1 | ALCOHOL PRODUCTION METHOD AND COMPOSITION | DAIKIN INDUSTRIES, LTD. (JP) | 2024-04-17 | — | — | EP | disclosed |
| US-20240109826-A1 | ALCOHOL PRODUCTION METHOD AND COMPOSITION | DAIKIN INDUSTRIES, LTD. (JP) | 2024-04-04 | — | — | US | disclosed |
| EP-4284801-A1 | SMALL MOLECULE INHIBITORS OF SALT INDUCIBLE KINASES | Janssen Biotech, Inc. (US) | 2023-12-06 | — | — | EP | disclosed |
| US-11803147-B2 | Endless belt with monomer having aliphatic ring | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2023-10-31 | — | — | US | disclosed |
| US-11785845-B2 | Composition | FUJIFILM CORPORATION (JP) | 2023-10-10 | — | — | US | disclosed |
| US-11687000-B2 | Sulfonium compound, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-27 | — | — | US | disclosed |
| WO-2022239587-A1 | ALCOHOL PRODUCTION METHOD AND COMPOSITION | ダイキン工業株式会社 | 2022-11-17 | — | — | WO | disclosed |
| WO-2022165529-A1 | SMALL MOLECULE INHIBITORS OF SALT INDUCIBLE KINASES | JANSSEN BIOTECH, INC. (US) | 2022-08-04 | — | — | WO | disclosed |
| US-20220113660-A1 | ENDLESS BELT WITH MONOMER HAVING ALIPHATIC RING | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2022-04-14 | — | — | US | disclosed |
| EP-1829850-A2 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-20070179309-A1 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| US-20070179309-A1 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| US-20070179309-A1 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| US-20060051702-A1 | Resist material and pattern formation method | BARINGS FINANCE LLC, AS COLLATERAL AGENT | 2006-03-09 | — | — | US | disclosed |
| EP-0837085-A1 | POLYCARBONATE-BASE POLYMER, PRODUCTION PROCESS, RESIN COATING FLUID PREPARED THEREFROM, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1998-04-22 | — | — | EP | disclosed |
| EP-0221188-B1 | TRANSPARENT POLYAMIDE ELASTOMER | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1992-04-01 | — | — | EP | disclosed |
| US-5043399-A | Blend of acetal resin and transparent polyamide elastomer | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1991-08-27 | — | — | US | disclosed |
| US-4820796-A | POLY AMIDE-ESTER-ETHER | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1989-04-11 | — | — | US | disclosed |
| EP-0221188-A1 | TRANSPARENT POLYAMIDE ELASTOMER | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1987-05-13 | — | — | EP | disclosed |