Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 5/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 2/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | EGFR | P00533 | 3/20 | 0.47 |
| ▸ | ERBB2 | P04626 | 3/20 | 0.47 |
| ▸ | MIF | P14174 | 1/20 | 0.46 |
| ▸ | BCL9 | O00512 | 1/20 | 0.45 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | RET | P07949 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3002802 | 0.94 | KMT2A (0.59) | KMT2ASMN1; SMN2THRBALDH1A1LMNA | |
| SCHEMBL3001326 | 0.94 | KMT2A (0.59) | KMT2ASMN1; SMN2THRBALDH1A1LMNA | |
| SCHEMBL28024339 | 0.94 | KMT2A (0.59) | KMT2ASMN1; SMN2THRBALDH1A1LMNA | |
| SCHEMBL1703804 | 0.90 | BCL9 (0.55) | KMT2ASMN1; SMN2THRBALDH1A1LMNA | |
| SCHEMBL11772586 | 0.90 | KMT2A (0.71) | KMT2ASMN1; SMN2ALDH1A1LMNAMAPT | |
| SCHEMBL5822065 | 0.86 | KMT2A (0.61) | KMT2ASMN1; SMN2THRBALDH1A1LMNA | |
| SCHEMBL7285233 | 0.85 | KMT2A (0.81) | KMT2ASMN1; SMN2THRBALDH1A1LMNA | |
| SCHEMBL29292301 | 0.84 | KMT2A (0.58) | KMT2AALDH1A1LMNAMAPTHTT | |
| SCHEMBL1143852 | 0.83 | KMT2A (0.58) | KMT2ASMN1; SMN2THRBALDH1A1LMNA | |
| SCHEMBL3681681 | 0.82 | KMT2A (0.53) | KMT2ASMN1; SMN2THRBALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5773191-A | Radiation-sensitive composition | HOECHST JAPAN LIMITED (JP) | 1998-06-30 | — | — | US | claimed |
| US-9188885-B2 | Reactive compound, charge transporting film, photoelectric conversion device, electrophotographic photoreceptor and method of producing the same, process cartridge, and image forming apparatus | FUJI XEROX CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20140079435-A1 | NOVEL REACTIVE COMPOUND, CHARGE TRANSPORTING FILM, PHOTOELECTRIC CONVERSION DEVICE, ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND METHOD OF PRODUCING THE SAME, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS | FUJI XEROX CO., LTD. (JP) | 2014-03-20 | — | — | US | disclosed |
| US-8669029-B2 | Reactive compound, charge transporting film, photoelectric conversion device, electrophotographic photoreceptor and method of producing the same, process cartridge, and image forming apparatus | FUJI XEROX CO., LTD. (JP) | 2014-03-11 | — | — | US | disclosed |
| US-20130052573-A1 | NOVEL REACTIVE COMPOUND, CHARGE TRANSPORTING FILM, PHOTOELECTRIC CONVERSION DEVICE, ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND METHOD OF PRODUCING THE SAME, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS | FUJI XEROX CO., LTD. (JP) | 2013-02-28 | — | — | US | disclosed |
| EP-1684118-B1 | Patterning process using a negative resist composition | SHINETSU CHEMICAL CO (JP) | 2012-04-18 | — | — | EP | disclosed |
| CN-1285639-C | Polyhydroxy alkane acid ester, its preparing process, charge controling agent containing its, toner adhesive and toner and image forming method using said toner and forming device of image | CANON KK (JP) | 2006-11-22 | — | — | CN | disclosed |
| EP-1684118-A1 | Negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-07-26 | — | — | EP | disclosed |
| CN-1232561-C | Polyhydroxy alkanoate copolymer and its preparation method | CANON KK (JP) | 2005-12-21 | — | — | CN | disclosed |
| EP-1579276-A1 | NOVEL POLYHYDROXYALKANOATE HAVING AMIDE, SULFONIC ACID OR SULFONATE ESTER GROUP, CHARGE CONTROL AGENT AND TONER | CANON KABUSHIKI KAISHA (JP) | 2005-09-28 | — | — | EP | disclosed |
| WO-2004061529-A1 | NOVEL POLYHYDROXYALKANOATE HAVING AMIDE, SULFONIC ACID OR SULFONATE ESTER GROUP, CHARGE CONTROL AGENT AND TONER | CANON KABUSHIKI KAISHA (JP) | 2004-07-22 | — | — | WO | disclosed |
| CN-1445257-A | Polyhydroxy alkanoate copolymer and its preparation method | CANON KK (JP) | 2003-10-01 | — | — | CN | disclosed |
| CN-1440991-A | Polyhydroxy alkane acid ester, its preparing process, charge controling agent containing its, toner adhesive and toner and image forming method using said toner and forming device of image | CANON KK (JP) | 2003-09-10 | — | — | CN | disclosed |
| EP-0756203-B1 | Radiation-sensitive composition | CLARIANT FINANCE BVI LTD (VG) | 2003-03-26 | — | — | EP | disclosed |
| US-5773191-A | Radiation-sensitive composition | HOECHST JAPAN LIMITED (JP) | 1998-06-30 | — | — | US | disclosed |
| EP-0756203-A1 | Radiation-sensitive composition | HOECHST INDUSTRY LIMITED (JP) | 1997-01-29 | — | — | EP | disclosed |