Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | CNR2 | P34972 | 7/20 | 0.40 |
| ▸ | CNR1 | P21554 | 3/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17052450 | 0.86 | CNR1 (0.38) | ALDH1A1LMNACNR2CNR1CYP1A2 | |
| SCHEMBL2682453 | 0.77 | KMT2A (0.47) | ALDH1A1LMNAL3MBTL1SMN1; SMN2KDM4E | |
| SCHEMBL19888578 | 0.74 | KDM4E (0.46) | ALDH1A1LMNACYP1A2MAPK1POLB | |
| SCHEMBL17036741 | 0.74 | ALDH1A1 (0.51) | ALDH1A1LMNACNR2CYP1A2L3MBTL1 | |
| SCHEMBL18407736 | 0.72 | ALDH1A1 (0.44) | ALDH1A1LMNAL3MBTL1MAPK1KDM4E | |
| SCHEMBL17052455 | 0.72 | CYP4F2 (0.33) | — | |
| SCHEMBL17039356 | 0.72 | ALDH1A1 (0.55) | ALDH1A1LMNAL3MBTL1TSHRSMN1; SMN2 | |
| SCHEMBL753684 | 0.72 | CYP4F2 (0.33) | — | |
| SCHEMBL17052460 | 0.72 | CYP4F2 (0.33) | — | |
| SCHEMBL13949204 | 0.71 | HTT (0.56) | ALDH1A1LMNATSHRPOLBSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150248054-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-03 | — | — | US | disclosed |