Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP8 | Q6V1X1 | 2/20 | 0.33 |
| ▸ | DPP9 | Q86TI2 | 2/20 | 0.33 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | DPP4 | P27487 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17052472 | 0.91 | — | — | |
| SCHEMBL17052468 | 0.90 | DPP8 (0.33) | DPP8DPP9CYP17A1CYP19A1DPP4 | |
| SCHEMBL2601709 | 0.88 | DPP8 (0.32) | DPP8DPP9CYP17A1CYP19A1DPP4 | |
| SCHEMBL12202186 | 0.86 | DPP8 (0.32) | DPP8DPP9CYP17A1CYP19A1 | |
| SCHEMBL12202170 | 0.86 | DPP8 (0.35) | DPP8DPP9CYP17A1CYP19A1DPP4 | |
| SCHEMBL14802697 | 0.83 | CYP17A1 (0.35) | DPP8DPP9CYP17A1CYP19A1DPP4 | |
| SCHEMBL2741143 | 0.83 | TSHR (0.37) | DPP8DPP9CYP17A1CYP19A1DPP4 | |
| SCHEMBL15905714 | 0.83 | CYP17A1 (0.35) | DPP8DPP9CYP17A1CYP19A1DPP4 | |
| SCHEMBL13563627 | 0.83 | CYP17A1 (0.35) | DPP8DPP9CYP17A1CYP19A1DPP4 | |
| SCHEMBL2625704 | 0.83 | DPP4 (0.40) | DPP8DPP9CYP17A1CYP19A1DPP4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9927708-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9632415-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9618850-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-20160202612-A1 | PATTERN FORMING PROCESS AND SHRINK AGENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-07-14 | — | — | US | disclosed |
| US-20160139512-A1 | PATTERN FORMING PROCESS AND SHRINK AGENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-19 | — | — | US | disclosed |
| US-20160124313-A1 | PATTERN FORMING PROCESS AND SHRINK AGENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-05 | — | — | US | disclosed |
| US-20150248054-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-03 | — | — | US | disclosed |