Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP8 | Q6V1X1 | 2/20 | 0.35 |
| ▸ | DPP9 | Q86TI2 | 2/20 | 0.35 |
| ▸ | DPP4 | P27487 | 3/20 | 0.33 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.31 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
| ▸ | MDH1 | P40925 | 1/20 | 0.30 |
| ▸ | MDH2 | P40926 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12202168 | 0.86 | DPP8 (0.33) | DPP8DPP9 | |
| SCHEMBL17052468 | 0.86 | DPP8 (0.33) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL17052467 | 0.86 | DPP8 (0.33) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL2601709 | 0.85 | DPP8 (0.32) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL12202186 | 0.83 | DPP8 (0.32) | DPP8DPP9CYP17A1CYP19A1MDH1 | |
| SCHEMBL9925211 | 0.82 | DPP8 (0.39) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL14802401 | 0.81 | DPP8 (0.39) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL15905714 | 0.80 | CYP17A1 (0.35) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL2741143 | 0.80 | TSHR (0.37) | DPP8DPP9DPP4CYP17A1CYP19A1 | |
| SCHEMBL14802697 | 0.80 | CYP17A1 (0.35) | DPP8DPP9DPP4CYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9250531-B2 | Method of forming resist pattern and negative tone-development resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-8735045-B2 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8450044-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-28 | — | — | US | disclosed |
| US-8034536-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| US-20110111343-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110097667-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-28 | — | — | US | disclosed |
| US-20100203445-A1 | NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20090297980-A1 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2009-12-03 | — | — | US | disclosed |