Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 15/20 | 0.53 |
| ▸ | CA2 | P00918 | 15/20 | 0.53 |
| ▸ | CA12 | O43570 | 11/20 | 0.53 |
| ▸ | CA9 | Q16790 | 11/20 | 0.53 |
| ▸ | MAPT | P10636 | 2/20 | 0.53 |
| ▸ | POLB | P06746 | 2/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL396033 | 0.89 | CA1 (0.61) | CA1CA2CA12CA9MAPT | |
| SCHEMBL395455 | 0.86 | CA1 (0.58) | CA1CA2CA12CA9 | |
| SCHEMBL29733673 | 0.86 | CA1 (0.58) | CA1CA2CA12CA9 | |
| SCHEMBL6277650 | 0.86 | CA1 (0.58) | CA1CA2CA12CA9 | |
| Benzenesulfonamide SCHEMBL11842417 | 0.81 | CA1 (0.57) | CA1CA2CA12CA9MAPT | |
| Benzenesulfonamide SCHEMBL27997661 | 0.79 | CA1 (0.59) | CA1CA2CA12CA9MAPT | |
| SCHEMBL11646832 | 0.79 | TDP1 (0.50) | CA1CA2CA12CA9MAPT | |
| SCHEMBL7597973 | 0.78 | TDP1 (0.64) | CA1CA2CA12CA9MAPT | |
| SCHEMBL1811660 | 0.76 | TDP1 (0.62) | CA1CA2CA12CA9MAPT | |
| SCHEMBL11842413 | 0.75 | TDP1 (0.56) | CA1CA2CA12CA9MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1399783-B1 | METHOD OF PROCESSING LITHOGRAPHIC PRINTING PLATE PRECURSORS | KODAK GRAPHIC COMM GMBH (DE) | 2013-01-09 | — | — | EP | disclosed |
| EP-1545878-B2 | THERMALLY SENSITIVE MULTILAYER IMAGEABLE ELEMENT | EASTMAN KODAK CO (US) | 2012-04-18 | — | — | EP | disclosed |
| EP-1545878-B1 | THERMALLY SENSITIVE MULTILAYER IMAGEABLE ELEMENT | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-09-13 | — | — | EP | disclosed |
| EP-1444552-B8 | METHOD FOR REUSE OF LOADED DEVELOPER | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-06-07 | — | — | EP | disclosed |
| EP-1444552-B1 | METHOD FOR REUSE OF LOADED DEVELOPER | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2006-04-19 | — | — | EP | disclosed |
| US-6899992-B2 | Polymerizable compounds with quadruple hydrogen bond forming groups | KODAK POLYCHROME GRAPHICS LLC (US) | 2005-05-31 | — | — | US | disclosed |
| US-6858359-B2 | Scuff resistance | KODAK POLYCHROME GRAPHICS, LLP (US) | 2005-02-22 | — | — | US | disclosed |
| US-6855487-B2 | Method and apparatus for refreshment and reuse of loaded developer | KODAK POLYCHROME GRAPHICS, LLC (US) | 2005-02-15 | — | — | US | disclosed |
| US-6852464-B2 | Coating underlayer over a hydrophilic surface of a substrate; coating imageable layer over underlayer; heating | KODAK POLYCHROME GRAPHICS, LLC (US) | 2005-02-08 | — | — | US | disclosed |
| US-6849372-B2 | Forming thermally imageable composite elements which provide developer resistance in desired regions, while maintaining white light desensitivity and durability. | KODAK POLYCHROME GRAPHICS (US) | 2005-02-01 | — | — | US | disclosed |
| EP-1291172-A2 | A multi-layer thermally imageable element | Kodak Polychrome Graphics LLC (US) | 2003-03-12 | — | — | EP | disclosed |
| US-20030036024-A1 | Developer for alkaline-developable lithographic printing plates | EASTMAN KODAK COMPANY | 2003-02-20 | — | — | US | disclosed |
| US-20030031948-A1 | Method of processing lithographic printing plate precursors | FPC INC. | 2003-02-13 | — | — | US | disclosed |
| EP-1268660-A1 | LITHOGRAPHIC PRINTING PLATE HAVING HIGH CHEMICAL RESISTANCE | Kodak Polychrome Graphics Company Ltd. (US) | 2003-01-02 | — | — | EP | disclosed |
| WO-2002101469-A1 | METHOD OF PROCESSING LITHOGRAPHIC PRINTING PLATE PRECURSORS | KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) | 2002-12-19 | — | — | WO | disclosed |
| WO-2002093264-A1 | DEVELOPER FOR ALKALINE-DEVELOPABLE LITHOGAPHIC PRINTING PLATES | KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) | 2002-11-21 | — | — | WO | disclosed |
| US-6358669-B1 | SUBSTRATE WITH HYDROPHILIC SURFACE, OVERCOATING | KODAK POLYCHROME GRAPHICS LLC | 2002-03-19 | — | — | US | disclosed |
| WO-2002014071-A1 | THERMAL DIGITAL LITHOGRAPHIC PRINTING PLATE | KODAK POLYCHROME GRAPHICS COMPANY LTD (US) | 2002-02-21 | — | — | WO | disclosed |
| US-6294311-B1 | UNDERLAYER CONTAINS A COMBINATION OF POLYMERIC MATERIALS THAT PROVIDES RESISTANCE BOTH TO FOUNTAIN SOLUTION AND TO AGGRESSIVE WASHES, SUCH AS A UV WASH; CAN BE USED IN EITHER THERMALLY IMAGEABLE OR PHOTOCHEMICALLY IMAGEABLE ELEMENTS. | KODAK POLYCHROME GRAPHICS LLC | 2001-09-25 | — | — | US | disclosed |
| WO-2001046318-A1 | LITHOGRAPHIC PRINTING PLATE HAVING HIGH CHEMICAL RESISTANCE | KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) | 2001-06-28 | — | — | WO | disclosed |