SCHEMBL17060523

SCHEMBL17060523

CCO[Si](CSC)(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4324581 0.79
SCHEMBL553998 0.79
SCHEMBL2950755 0.74
SCHEMBL5274521 0.74
SCHEMBL29420351 0.74
SCHEMBL29420362 0.74
SCHEMBL4468666 0.74
SCHEMBL23526550 0.72
SCHEMBL30488743 0.72
SCHEMBL29420355 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11127952-B2 Core-shell structure and production method therefof, composition for negative electrode using the core-shell structure as negative electrode active material, negative electrode and secondary battery JNC CORPORATION (JP) 2021-09-21 US disclosed
CN-111640917-A Composite, SiOC structure, method for producing same, negative electrode, composition, and secondary battery 捷恩智株式会社 2020-09-08 CN disclosed
US-20200280057-A1 SILICON-BASED FINE PARTICLE/SILICON-CONTAINING POLYMER COMPOSITE AND METHOD OF PRODUCING THE SAME, SiOC STRUCTURE AND METHOD OF PRODUCING THE SAME, NEGATIVE ELECTRODE COMPOSITION USING SiOC STRUCTURE, NEGATIVE ELECTRODE, AND LITHIUM ION SECONDARY BATTERY JNC CORPORATION (JP) 2020-09-03 US disclosed
CN-110635119-A Core-shell structure and method for producing same, composition for negative electrode and method for producing same, negative electrode, and secondary battery 捷恩智株式会社 2019-12-31 CN disclosed
CN-106414559-B The application method of curability polysilsesquioxane compound, preparation method, solidification compound, solidfied material and solidification compound etc. 琳得科株式会社 2019-09-20 CN disclosed
US-10370498-B2 Curable polysilsesquioxane compound, production method thereof, curable composition, cured product and use method of curable composition LINTEC CORPORATION (JP) 2019-08-06 US disclosed
CN-104781309-B The application method of curability polysilsesquioxane compound, its manufacture method, solidification compound, solidfied material and solidification compound etc. 琳得科株式会社 2018-01-19 CN disclosed
US-20170073474-A1 CURABLE POLYSILSESQUIOXANE COMPOUND, PRODUCTION METHOD THEREOF, CURABLE COMPOSITION, CURED PRODUCT AND USE METHOD OF CURABLE COMPOSITION, ETC. LINTEC CORPORATION (JP) 2017-03-16 US disclosed
EP-3141573-A1 CURABLE POLYSILSESQUIOXANE COMPOUND, PRODUCTION METHOD THEREOF, CURABLE COMPOSITION, CURED PRODUCT AND USE METHOD OF CURABLE COMPOSITION, ETC. LINTEC Corporation (JP) 2017-03-15 EP disclosed
CN-106414559-A Curable polysilsesquioxane compound, production method thereof, curable composition, cured product and use method of curable composition, etc. 琳得科株式会社 2017-02-15 CN disclosed
US-9487627-B2 Curable polysilsesquioxane compound, method for producing same, curable composition, cured product, and method for using curable composition or the like LINTEC CORPORATION (JP) 2016-11-08 US disclosed
US-20150299396-A1 CURABLE POLYSILSESQUIOXANE COMPOUND, METHOD FOR PRODUCING SAME, CURABLE COMPOSITION, CURED PRODUCT, AND METHOD FOR USING CURABLE COMPOSITION OR THE LIKE LINTEC CORPORATION (JP) 2015-10-22 US disclosed
EP-2915834-A1 CURABLE POLYSILSESQUIOXANE COMPOUND, METHOD FOR PRODUCING SAME, CURABLE COMPOSITION, CURED PRODUCT, AND METHOD FOR USING CURABLE COMPOSITION OR LIKE Lintec Corporation (JP) 2015-09-09 EP disclosed
CN-104781309-A Curable polysilsesquioxane compound, method for producing same, curable composition, cured product, and method for using curable composition or like LINTEC CORP 2015-07-15 CN disclosed