⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL553998 | 0.81 | — | — | |
| SCHEMBL17060523 | 0.79 | — | — | |
| Propane SCHEMBL27576419 | 0.79 | — | — | |
| SCHEMBL4468666 | 0.77 | — | — | |
| SCHEMBL27920180 | 0.77 | — | — | |
| SCHEMBL5274521 | 0.77 | — | — | |
| SCHEMBL2950755 | 0.77 | — | — | |
| SCHEMBL23526550 | 0.75 | — | — | |
| SCHEMBL23526722 | 0.73 | — | — | |
| SCHEMBL7187117 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2618216-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | HITACHI CHEMICAL CO LTD (JP) | 2019-05-29 | — | — | EP | disclosed |
| US-8836089-B2 | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| EP-2618216-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | Hitachi Chemical Co., Ltd. (JP) | 2013-07-24 | — | — | EP | disclosed |
| US-20130168859-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | RESONAC CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |
| CN-103097954-A | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2013-05-08 | — | — | CN | disclosed |
| US-7629430-B2 | Hybrid silicon-containing coupling agents for filled elastomer compositions | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2009-12-08 | — | — | US | disclosed |
| US-20070185279-A1 | Hydrolysis; dehydrogenation; improved performance | MOMENTIVE PERFORMANCE MATERIALS INC. | 2007-08-09 | — | — | US | disclosed |
| US-7169872-B2 | Hybrid silicon-containing coupling agents for filled elastomer compositions | GENERAL ELECTRIC CO. (US) | 2007-01-30 | — | — | US | disclosed |
| CN-1610687-A | Hybrid silicon-containing coupling agents for filled elastomer compositions | CROMPTON CORP (US) | 2005-04-27 | — | — | CN | disclosed |
| EP-1383776-A2 | HYBRID SILICON-CONTAINING COUPLING AGENTS FOR FILLED ELASTOMER COMPOSITIONS | CROMPTON CORPORATION (US) | 2004-01-28 | — | — | EP | disclosed |
| US-20030055139-A1 | Hybrid silicon-containing coupling agents for filled elastomer compositions | MOMENTIVE PERFORMANCE MATERIALS INC. | 2003-03-20 | — | — | US | disclosed |
| WO-2002096914-A2 | HYBRID SILICON-CONTAINING COUPLING AGENTS FOR FILLED ELASTOMER COMPOSITIONS | CROMPTON CORPORATION (US) | 2002-12-05 | — | — | WO | disclosed |