⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5268888 | 0.78 | — | — | |
| SCHEMBL6907314 | 0.76 | — | — | |
| SCHEMBL9054932 | 0.70 | — | — | |
| Carbon Monoxide SCHEMBL5690945 | 0.70 | — | — | |
| SCHEMBL27285473 | 0.69 | TSHR (0.31) | — | |
| SCHEMBL8381162 | 0.69 | — | — | |
| SCHEMBL1051197 | 0.69 | — | — | |
| SCHEMBL8732649 | 0.69 | — | — | |
| SCHEMBL8382735 | 0.69 | — | — | |
| SCHEMBL8381157 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |