SCHEMBL1707235

SCHEMBL1707235

CO[Si]1(OC)CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6057981 0.96
SCHEMBL1706226 0.96
SCHEMBL1482496 0.92
SCHEMBL6053218 0.81
SCHEMBL2862483 0.79
SCHEMBL20769862 0.73 ALDH1A1 (0.35)
SCHEMBL20769888 0.71 ALDH1A1 (0.33)
SCHEMBL2867766 0.69
SCHEMBL2870389 0.68
SCHEMBL9404232 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119452116-A Selective atomic layer deposition of metal oxide or dielectric layer regions on patterned substrates 盖列斯特有限公司 2025-02-14 CN claimed
CN-119054046-A Intrinsic regioselective deposition of mixed oxide dielectric films 盖列斯特有限公司 2024-11-29 CN claimed
US-20240182499-A1 ALKOXYSILACYCLIC OR ACYLOXYSILACYCLIC COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME VERSUM MAT US LLC (US) 2024-06-06 US claimed
US-11884689-B2 Alkoxysilacyclic or acyloxysilacyclic compounds and methods for depositing films using same VERSUM MATERIALS US, LLC 2024-01-30 US claimed
US-20220044928-A1 SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME VERSUM MATERIALS US, LLC (US) 2022-02-10 US claimed
US-11158498-B2 Silicon compounds and methods for depositing films using same VERSUM MATERIALS US, LLC (US) 2021-10-26 US claimed
US-20200354386-A1 ALKOXYSILACYCLIC OR ACYLOXYSILACYCLIC COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME VERSUM MATERIALS US, LLC 2020-11-12 US claimed
CN-111051568-A Alkoxy silicon heterocyclic or acyloxy silicon heterocyclic compound and method for depositing film using the same 弗萨姆材料美国有限责任公司 2020-04-21 CN claimed
US-12338346-B2 Radiation curable composition with improved mechanical properties HENKEL AG & CO. KGAA (DE) 2025-06-24 US disclosed
CN-119452116-A Selective atomic layer deposition of metal oxide or dielectric layer regions on patterned substrates 盖列斯特有限公司 2025-02-14 CN disclosed
US-20250034361-A1 COMPOSITION FOR SILICONE RUBBER COMPOUNDS NITROCHEMIE ASCHAU GMBH (DE) 2025-01-30 US disclosed
CN-119054046-A Intrinsic regioselective deposition of mixed oxide dielectric films 盖列斯特有限公司 2024-11-29 CN disclosed
US-20240182499-A1 ALKOXYSILACYCLIC OR ACYLOXYSILACYCLIC COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME VERSUM MAT US LLC (US) 2024-06-06 US disclosed
US-11884689-B2 Alkoxysilacyclic or acyloxysilacyclic compounds and methods for depositing films using same VERSUM MATERIALS US, LLC 2024-01-30 US disclosed
US-6624264-B2 Preparation from a tetralkyl silicate and an alkylenebis(magnesium bromide) ATOFINA (FR) 2003-09-23 US disclosed
WO-2003037905-A1 SILICON COMPOUNDS AMEDIS PHARMACEUTICALS LIMITED (GB) 2003-05-08 WO disclosed
US-6462214-B1 COMPRISING ADDING AN SI-SUBSTITUTED SILACYCLOALKANE TO A SUSPENSION OF LITHIUM ALUMINUM HYDRIDE IN A GLYCOL DIETHER DOW CORNING CORPORATION 2002-10-08 US disclosed
EP-0765881-B1 Alkoxysilacycloalkanes, their preparation and use in the polymerisation of olefin ATOFINA (FR) 2001-05-30 EP disclosed
EP-0765881-A1 Alkoxysilacycloalkanes, their preparation and use in the polymerisation of olefin ELF ATOCHEM S.A. (FR) 1997-04-02 EP disclosed
US-5610259-A COMPRISING DIFUNCTIONAL SILACYCLOALKANES AND CROSSLINKER; CAULKING, SEALANTS GENERAL ELECTRIC COMPANY (US) 1997-03-11 US disclosed