Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17102771 | 0.88 | — | — | |
| SCHEMBL14568685 | 0.75 | TSHR (0.30) | TSHR | |
| SCHEMBL27744296 | 0.73 | — | — | |
| SCHEMBL17691322 | 0.73 | — | — | |
| SCHEMBL17701561 | 0.73 | — | — | |
| SCHEMBL31536693 | 0.73 | — | — | |
| SCHEMBL17701553 | 0.73 | — | — | |
| SCHEMBL17691330 | 0.73 | — | — | |
| SCHEMBL19101227 | 0.73 | — | — | |
| SCHEMBL31722383 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC | 2025-08-28 | — | — | US | claimed |
| EP-4493734-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | claimed |
| WO-2023201271-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC (US) | 2023-10-19 | — | — | WO | claimed |
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| CN-113088927-A | Compositions and methods for depositing silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-07-09 | — | — | CN | claimed |
| US-20150275355-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-10-01 | — | — | US | claimed |
| EP-2924143-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-09-30 | — | — | EP | claimed |
| US-20250316474-A1 | HIGH MODULUS CARBON DOPED SILICON OXIDE FILM FOR MOLD STACK SCALING SOLUTIONS IN ADVANCED MEMORY APPLICATIONS | LAM RES CORP (US) | 2025-10-09 | — | — | US | disclosed |
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC | 2025-08-28 | — | — | US | disclosed |
| EP-4493734-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | disclosed |
| CN-119213168-A | Boron-containing precursors for ALD deposition of boron nitride films | 弗萨姆材料美国有限责任公司 | 2024-12-27 | — | — | CN | disclosed |
| WO-2023225132-A1 | HIGH MODULUS CARBON DOPED SILICON OXIDE FILM FOR MOLD STACK SCALING SOLUTIONS IN ADVANCED MEMORY APPLICATIONS | LAM RESEARCH CORPORATION (US) | 2023-11-23 | — | — | WO | disclosed |
| WO-2023201271-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC (US) | 2023-10-19 | — | — | WO | disclosed |
| EP-3663301-A1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | Versum Materials US, LLC (US) | 2020-06-10 | — | — | EP | disclosed |
| US-20160293410-A1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF A BORON CONTAINING FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-10-06 | — | — | US | disclosed |
| US-20150275355-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-10-01 | — | — | US | disclosed |
| US-20150275355-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-10-01 | — | — | US | disclosed |
| US-20150275355-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-10-01 | — | — | US | disclosed |
| EP-2924143-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-09-30 | — | — | EP | disclosed |
| EP-2924143-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-09-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160293410-A1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF A BORON CONTAINING FILMS | CD79B, BCL6B, BCL6 | TSHR 4628/4885 |
| US-20150275355-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | NR4A3, NR4A1, RTN4 | TSHR 769/4885 |
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | AKR1C3, NR1I3, AKR1C2 | TSHR 467/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.