SCHEMBL17106643

SCHEMBL17106643

Oc1ccc(Oc2ccc(C(c3ccc(Oc4ccc(O)cc4)cc3)C(c3ccc(O)cc3)c3ccc(O)cc3)cc2)cc1

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.70
ESR2 Q92731 4/20 0.70
MEN1 O00255 2/20 0.70
KMT2A Q03164 2/20 0.70
LTA4H P09960 6/20 0.58
NR1H2 P55055 1/20 0.58
BAX Q07812 1/20 0.58
PARP10 Q53GL7 1/20 0.48
PDCD1 Q15116 1/20 0.44
CD274 Q9NZQ7 1/20 0.44
KDM4E B2RXH2 1/20 0.40
NPC1 O15118 1/20 0.40
CA12 O43570 1/20 0.40
GMNN O75496 1/20 0.40
ALDH1A1 P00352 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
LMNA P02545 1/20 0.40
CA3 P07451 1/20 0.40
CYP3A4 P08684 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1979669 1.00 ESR1 (0.70) ESR1ESR2MEN1KMT2ALTA4H
SCHEMBL249169 0.84 ESR2 (1.00) ESR1ESR2MEN1KMT2ALTA4H
SCHEMBL18198 0.84 ESR2 (1.00) ESR1ESR2MEN1KMT2ALTA4H
SCHEMBL7811939 0.84 ESR2 (1.00) ESR1ESR2MEN1KMT2ALTA4H
SCHEMBL3175106 0.84 ESR2 (1.00) ESR1ESR2MEN1KMT2ALTA4H
SCHEMBL133408 0.84 ESR1 (0.58) ESR1ESR2MEN1KMT2APDCD1
SCHEMBL25070443 0.83 ESR1 (0.67) ESR1ESR2MEN1KMT2ALTA4H
SCHEMBL10445959 0.83 ESR1 (0.67) ESR1ESR2MEN1KMT2ALTA4H
SCHEMBL8975027 0.81 ESR2 (0.64) ESR1ESR2MEN1KMT2ALTA4H
SCHEMBL12804466 0.81 ESR1 (0.73) ESR1ESR2MEN1KMT2ALTA4H

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10000659-B2 Insulating layer-forming composition and use thereof HILTI AKTIENGESELLSCHAFT (LI) 2018-06-19 US disclosed
US-20150368509-A1 POLYAMINES HAVING SECONDARY ALIPHATIC AMINO GROUPS SIKA TECHNOLOGY AG (CH) 2015-12-24 US disclosed
US-20150275031-A1 INSULATING LAYER-FORMING COMPOSITION AND USE THEREOF HILTI AKTIENGESELLSCHAFT (LI) 2015-10-01 US disclosed