Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | HBB | P68871 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.31 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.31 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1715111 | 0.88 | TP53 (0.44) | ELANESMN1; SMN2TP53HBBNPSR1 | |
| SCHEMBL22644804 | 0.88 | TP53 (0.44) | ELANESMN1; SMN2TP53HBBNPSR1 | |
| SCHEMBL1715540 | 0.83 | TP53 (0.35) | SMN1; SMN2TP53HBBNPSR1OPRM1 | |
| SCHEMBL11511463 | 0.77 | TP53 (0.35) | SMN1; SMN2TP53HBBALDH1A1OPRM1 | |
| SCHEMBL11447332 | 0.75 | TP53 (0.33) | SMN1; SMN2TP53HBBALDH1A1 | |
| SCHEMBL10953361 | 0.74 | ALDH1A1 (0.35) | SMN1; SMN2TP53HBBALDH1A1 | |
| SCHEMBL11089324 | 0.74 | TP53 (0.47) | ELANESMN1; SMN2TP53HBBOPRM1 | |
| SCHEMBL11412044 | 0.73 | ALDH1A1 (0.37) | SMN1; SMN2TP53HBBALDH1A1 | |
| SCHEMBL11421576 | 0.73 | ALDH1A1 (0.37) | SMN1; SMN2TP53HBBALDH1A1 | |
| SCHEMBL11535278 | 0.73 | TP53 (0.34) | SMN1; SMN2TP53HBBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025095106-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2025-05-08 | — | — | WO | disclosed |
| CN-114761876-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114746468-A | Method for producing polymer | 日产化学株式会社 | 2022-07-12 | — | — | CN | disclosed |
| WO-2021111976-A1 | METHOD FOR PRODUCING POLYMER | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| WO-2021111977-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| US-9240327-B2 | Resist underlayer film-forming composition for EUV lithography containing condensation polymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-01-19 | — | — | US | disclosed |
| US-20140170567-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR EUV LITHOGRAPHY CONTAINING CONDENSATION POLYMER | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-06-19 | — | — | US | disclosed |
| EP-1757986-B1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER AND METHOD FOR FORMING PHOTORESIST PATTERN | NISSAN CHEMICAL IND LTD (JP) | 2014-05-14 | — | — | EP | disclosed |
| EP-1813987-B1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2011-08-24 | — | — | EP | disclosed |
| EP-1876495-B1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2011-07-20 | — | — | EP | disclosed |
| US-7790356-B2 | Condensation type polymer-containing anti-reflective coating for semiconductor | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-09-07 | — | — | US | disclosed |
| US-7632626-B2 | a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-15 | — | — | US | disclosed |
| US-7595144-B2 | Sulfonate-containing anti-reflective coating forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-09-29 | — | — | US | disclosed |
| US-20080268379-A1 | a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-10-30 | — | — | US | disclosed |
| US-20080038678-A1 | Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| EP-1876495-A1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2008-01-09 | — | — | EP | disclosed |
| US-20080003524-A1 | Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| EP-1813987-A1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2007-08-01 | — | — | EP | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |