SCHEMBL17159693

SCHEMBL17159693

CCc1cc(CC)c2sc3ccccc3c(=O)c2c1.O=c1c2ccccc2sc2ccccc12

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.50
MAPT P10636 6/20 0.50
L3MBTL1 Q9Y468 4/20 0.50
POLB P06746 3/20 0.50
LMNA P02545 3/20 0.50
HCRTR1 O43613 2/20 0.50
RAB9A P51151 5/20 0.46
KDM4E B2RXH2 4/20 0.46
NPC1 O15118 3/20 0.46
TDP1 Q9NUW8 1/20 0.46
ATM Q13315 1/20 0.43
CYP19A1 P11511 1/20 0.42
KMT2A Q03164 3/20 0.40
MEN1 O00255 2/20 0.40
GAA P10253 1/20 0.40
MAOA P21397 1/20 0.39
MAOB P27338 1/20 0.39
HPGD P15428 2/20 0.38
GLA P06280 1/20 0.38
ALOX15 P16050 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29351106 0.98 MAPT (0.51) ALDH1A1MAPTL3MBTL1POLBLMNA
SCHEMBL29349573 0.98 MAPT (0.51) ALDH1A1MAPTL3MBTL1POLBLMNA
SCHEMBL28149 0.98 MAPT (0.51) ALDH1A1MAPTL3MBTL1POLBLMNA
SCHEMBL27859738 0.98 MAPT (0.51) ALDH1A1MAPTL3MBTL1POLBLMNA
SCHEMBL28082263 0.97 MAPT (0.50) ALDH1A1MAPTL3MBTL1POLBLMNA
Hydrochloric Acid SCHEMBL27949933 0.97 MAPT (0.50) ALDH1A1MAPTL3MBTL1POLBLMNA
Anthracene SCHEMBL28279871 0.93 L3MBTL1 (0.47) ALDH1A1MAPTL3MBTL1POLBLMNA
Anthraquinone SCHEMBL28307908 0.92 L3MBTL1 (0.46) ALDH1A1MAPTL3MBTL1POLBLMNA
SCHEMBL20657179 0.90 MAPT (0.47) ALDH1A1MAPTL3MBTL1POLBLMNA
SCHEMBL21357716 0.90 KDM4E (0.64) ALDH1A1MAPTL3MBTL1POLBLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111699212-A Polyester film for dry film resist base material 三菱化学株式会社 2020-09-22 CN disclosed
US-9908265-B2 Method of manufacturing mold, and molded article having fine relief structure on surface and method of manufacturing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2018-03-06 US disclosed
US-20150290844-A1 METHOD OF MANUFACTURING MOLD, AND MOLDED ARTICLE HAVING FINE RELIEF STRUCTURE ON SURFACE AND METHOD OF MANUFACTURING THE SAME KANAGAWA INSTITUTE OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2015-10-15 US disclosed