Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17175392 | 0.89 | ALDH1A1 (0.37) | ALDH1A1TSHRSLC7A5MEN1KMT2A | |
| SCHEMBL14177779 | 0.83 | ALDH1A1 (0.38) | ALDH1A1TSHRSLC7A5MEN1KMT2A | |
| SCHEMBL17147937 | 0.80 | ALDH1A1 (0.40) | ALDH1A1TSHRSLC7A5MEN1KMT2A | |
| SCHEMBL16247796 | 0.79 | ALDH1A1 (0.35) | ALDH1A1TSHRSLC7A5MEN1KMT2A | |
| SCHEMBL17424296 | 0.78 | ALDH1A1 (0.35) | ALDH1A1TSHRSLC7A5MEN1KMT2A | |
| SCHEMBL18474085 | 0.77 | SLC7A5 (0.39) | ALDH1A1TSHRSLC7A5MEN1KMT2A | |
| SCHEMBL15299182 | 0.77 | ALDH1A1 (0.34) | ALDH1A1TSHRSLC7A5MEN1KMT2A | |
| SCHEMBL17175301 | 0.77 | ALDH1A1 (0.34) | ALDH1A1TSHRSLC7A5MEN1KMT2A | |
| SCHEMBL25634713 | 0.77 | MEN1 (0.33) | MEN1KMT2ACYP2D6CYP2C19 | |
| SCHEMBL14667707 | 0.76 | SLC7A5 (0.40) | ALDH1A1TSHRSLC7A5MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150293446-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |